共 50 条
- [41] Breakdown voltage and current collapse of F-plasma treated AlGaN/GaN HEMTsJournal of Semiconductors, 2014, 35 (01) : 65 - 68王冲论文数: 0 引用数: 0 h-index: 0机构: Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics陈冲论文数: 0 引用数: 0 h-index: 0机构: Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics何云龙论文数: 0 引用数: 0 h-index: 0机构: Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics郑雪峰论文数: 0 引用数: 0 h-index: 0机构: Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics马晓华论文数: 0 引用数: 0 h-index: 0机构: Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics张进成论文数: 0 引用数: 0 h-index: 0机构: Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics毛维论文数: 0 引用数: 0 h-index: 0机构: Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics郝跃论文数: 0 引用数: 0 h-index: 0机构: Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics
- [42] Performance Improvement and Current Collapse Suppression of Al2O3/AlGaN/GaN HEMTs Achieved by Fluorinated Graphene PassivationIEEE ELECTRON DEVICE LETTERS, 2017, 38 (05) : 596 - 599Shen, Lingyan论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R ChinaZhang, Dongliang论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R ChinaCheng, Xinhong论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R ChinaZheng, Li论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R ChinaXu, Dawei论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R ChinaWang, Qian论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R ChinaLi, Jingjie论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R ChinaCao, Duo论文数: 0 引用数: 0 h-index: 0机构: Shanghai Normal Univ, Dept Phys, Shanghai 200234, Peoples R China Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R ChinaYu, Yuehui论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
- [43] Analysis of lags and current collapse in field-plate AlGaN/GaN HEMTs with deep acceptors in a buffer layerPHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 13 NO 5-6, 2016, 13 (5-6): : 341 - 344Noda, Naohiro论文数: 0 引用数: 0 h-index: 0机构: Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, JapanTsurumaki, Ryouhei论文数: 0 引用数: 0 h-index: 0机构: Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, JapanHorio, Kazushige论文数: 0 引用数: 0 h-index: 0机构: Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, Japan
- [44] Effect of Acceptor-Type Traps in GaN Buffer Layer on Current Collapse of ε-Ga2O3/GaN HEMTsJOURNAL OF ELECTRONIC MATERIALS, 2025, 54 (04) : 3086 - 3096Qu, Andeng论文数: 0 引用数: 0 h-index: 0机构: Hong Kong Univ Sci & Technol Guangzhou, Adv Mat Thrust, Funct Hub, Guangzhou 511466, Peoples R China Hong Kong Univ Sci & Technol Guangzhou, Adv Mat Thrust, Funct Hub, Guangzhou 511466, Peoples R ChinaXie, Zhigao论文数: 0 引用数: 0 h-index: 0机构: Hong Kong Univ Sci & Technol Guangzhou, Adv Mat Thrust, Funct Hub, Guangzhou 511466, Peoples R China Hong Kong Univ Sci & Technol Guangzhou, Adv Mat Thrust, Funct Hub, Guangzhou 511466, Peoples R ChinaWang, Yan论文数: 0 引用数: 0 h-index: 0机构: Hong Kong Univ Sci & Technol Guangzhou, Adv Mat Thrust, Funct Hub, Guangzhou 511466, Peoples R China Hong Kong Univ Sci & Technol Guangzhou, Adv Mat Thrust, Funct Hub, Guangzhou 511466, Peoples R ChinaHu, Guofeng论文数: 0 引用数: 0 h-index: 0机构: Hong Kong Univ Sci & Technol Guangzhou, Adv Mat Thrust, Funct Hub, Guangzhou 511466, Peoples R China Hong Kong Univ Sci & Technol Guangzhou, Adv Mat Thrust, Funct Hub, Guangzhou 511466, Peoples R ChinaTan, Chee-Keong论文数: 0 引用数: 0 h-index: 0机构: Hong Kong Univ Sci & Technol Guangzhou, Adv Mat Thrust, Funct Hub, Guangzhou 511466, Peoples R China Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Peoples R China Hong Kong Univ Sci & Technol Guangzhou, Guangzhou Municipal Key Lab Mat Informat, Guangzhou 511453, Guangdong, Peoples R China Hong Kong Univ Sci & Technol Guangzhou, Guangzhou Municipal Key Lab Integrated Circuits De, Guangzhou 511453, Guangdong, Peoples R China Hong Kong Univ Sci & Technol Guangzhou, Adv Mat Thrust, Funct Hub, Guangzhou 511466, Peoples R China
- [45] Field-Plate Structure Dependence of Current Collapse Phenomena in High-Voltage GaN-HEMTsIEEE ELECTRON DEVICE LETTERS, 2010, 31 (07) : 659 - 661Saito, Wataru论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, Japan Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, JapanKakiuchi, Yorito论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, Japan Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, JapanNitta, Tomohiro论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, Japan Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, JapanSaito, Yasunobu论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, Japan Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, JapanNoda, Takao论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, Japan Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, JapanFujimoto, Hidetoshi论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, Japan Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, JapanYoshioka, Akira论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, Japan Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, JapanOhno, Tetsuya论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, Japan Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, JapanYamaguchi, Masakazu论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, Japan Toshiba Co Ltd, Semiconductor Co, Kawasaki, Kanagawa 2128583, Japan
- [46] Reduced Current Collapse in Multi-Fingered AlGaN/GaN MOS-HEMTs with Dual Field Plate2017 IEEE INTERNATIONAL MEETING FOR FUTURE OF ELECTRON DEVICES, KANSAI (IMFEDK), 2017, : 92 - 93Yamaguchi, R.论文数: 0 引用数: 0 h-index: 0机构: Univ Fukui, Grad Sch Engn, 3-9-1 Bunkyo, Fukui 9108507, Japan Univ Fukui, Grad Sch Engn, 3-9-1 Bunkyo, Fukui 9108507, JapanSuzuki, Y.论文数: 0 引用数: 0 h-index: 0机构: Univ Fukui, Grad Sch Engn, 3-9-1 Bunkyo, Fukui 9108507, Japan Univ Fukui, Grad Sch Engn, 3-9-1 Bunkyo, Fukui 9108507, JapanAsubar, J. T.论文数: 0 引用数: 0 h-index: 0机构: Univ Fukui, Grad Sch Engn, 3-9-1 Bunkyo, Fukui 9108507, Japan Univ Fukui, Grad Sch Engn, 3-9-1 Bunkyo, Fukui 9108507, JapanTokuda, H.论文数: 0 引用数: 0 h-index: 0机构: Univ Fukui, Grad Sch Engn, 3-9-1 Bunkyo, Fukui 9108507, Japan Univ Fukui, Grad Sch Engn, 3-9-1 Bunkyo, Fukui 9108507, JapanKuzuhara, M.论文数: 0 引用数: 0 h-index: 0机构: Univ Fukui, Grad Sch Engn, 3-9-1 Bunkyo, Fukui 9108507, Japan Univ Fukui, Grad Sch Engn, 3-9-1 Bunkyo, Fukui 9108507, Japan
- [47] Effect of backside dry etching on the device performance of AlGaN/GaN HEMTsNANOTECHNOLOGY, 2021, 32 (35)Ji, Keyu论文数: 0 引用数: 0 h-index: 0机构: Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R China Chinese Acad Sci, CAS Ctr Excellence Nanosci, Beijing Inst Nanoenergy & Nanosyst, Beijing Key Lab Micronano Energy & Sensor, Beijing 101400, Peoples R China Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R ChinaCui, Xiao论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, CAS Ctr Excellence Nanosci, Beijing Inst Nanoenergy & Nanosyst, Beijing Key Lab Micronano Energy & Sensor, Beijing 101400, Peoples R China Univ Chinese Acad Sci, Sch Nanosci & Technol, Beijing 100049, Peoples R China Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R ChinaChen, Jiwei论文数: 0 引用数: 0 h-index: 0机构: Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R China Chinese Acad Sci, CAS Ctr Excellence Nanosci, Beijing Inst Nanoenergy & Nanosyst, Beijing Key Lab Micronano Energy & Sensor, Beijing 101400, Peoples R China Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R ChinaGuo, Qi论文数: 0 引用数: 0 h-index: 0机构: Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R China Chinese Acad Sci, CAS Ctr Excellence Nanosci, Beijing Inst Nanoenergy & Nanosyst, Beijing Key Lab Micronano Energy & Sensor, Beijing 101400, Peoples R China Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R ChinaJiang, Bing论文数: 0 引用数: 0 h-index: 0机构: Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R China Chinese Acad Sci, CAS Ctr Excellence Nanosci, Beijing Inst Nanoenergy & Nanosyst, Beijing Key Lab Micronano Energy & Sensor, Beijing 101400, Peoples R China Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R ChinaWang, Bingjun论文数: 0 引用数: 0 h-index: 0机构: Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R China Chinese Acad Sci, CAS Ctr Excellence Nanosci, Beijing Inst Nanoenergy & Nanosyst, Beijing Key Lab Micronano Energy & Sensor, Beijing 101400, Peoples R China Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R ChinaSun, Wenhong论文数: 0 引用数: 0 h-index: 0机构: Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R China Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R ChinaHu, Weiguo论文数: 0 引用数: 0 h-index: 0机构: Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R China Chinese Acad Sci, CAS Ctr Excellence Nanosci, Beijing Inst Nanoenergy & Nanosyst, Beijing Key Lab Micronano Energy & Sensor, Beijing 101400, Peoples R China Univ Chinese Acad Sci, Sch Nanosci & Technol, Beijing 100049, Peoples R China Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R ChinaHua, Qilin论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, CAS Ctr Excellence Nanosci, Beijing Inst Nanoenergy & Nanosyst, Beijing Key Lab Micronano Energy & Sensor, Beijing 101400, Peoples R China Univ Chinese Acad Sci, Sch Nanosci & Technol, Beijing 100049, Peoples R China Guangxi Univ, Ctr Nanoenergy Res, Sch Phys Sci & Technol, Nanning 530004, Guangxi, Peoples R China
- [48] Role of buffer doping and pre-existing trap states in the current collapse and degradation of AlGaN/GaN HEMTs2014 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM, 2014,论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:Stocco, Antonio论文数: 0 引用数: 0 h-index: 0机构: Univ Padua, Dept Informat Engn, Padua, Italy Univ Padua, Dept Informat Engn, Padua, ItalyCester, Andrea论文数: 0 引用数: 0 h-index: 0机构: Univ Padua, Dept Informat Engn, Padua, Italy Univ Padua, Dept Informat Engn, Padua, ItalyMeneghesso, Gaudenzio论文数: 0 引用数: 0 h-index: 0机构: Univ Padua, Dept Informat Engn, Padua, Italy Univ Padua, Dept Informat Engn, Padua, ItalyZanoni, Enrico论文数: 0 引用数: 0 h-index: 0机构: Univ Padua, Dept Informat Engn, Padua, Italy Univ Padua, Dept Informat Engn, Padua, ItalyChini, Alessandro论文数: 0 引用数: 0 h-index: 0机构: Univ Modena & Reggio Emilia, Modena, Italy Univ Padua, Dept Informat Engn, Padua, ItalyPantellini, Alessio论文数: 0 引用数: 0 h-index: 0机构: Selex ES, I-00131 Rome, Italy Univ Padua, Dept Informat Engn, Padua, ItalyLanzieri, Claudio论文数: 0 引用数: 0 h-index: 0机构: Selex ES, I-00131 Rome, Italy Univ Padua, Dept Informat Engn, Padua, Italy
- [49] Impact of dual field plates on drain current degradation in InAlN/AlN/GaN HEMTsSEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2016, 31 (12)Li, Wei论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R China Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R ChinaWang, Quan论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R China Xian Univ Posts & Telecommun, Sch Elect Engn, Xian, Peoples R China Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R ChinaZhan, Xiangmi论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R China Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R ChinaYan, Junda论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R China Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R ChinaJiang, Lijuan论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R China Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R ChinaYin, Haibo论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R China Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R ChinaGong, Jiamin论文数: 0 引用数: 0 h-index: 0机构: Xian Univ Posts & Telecommun, Sch Elect Engn, Xian, Peoples R China Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R ChinaWang, Xiaoliang论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R China Beijing Key Lab Low Dimens Semicond Mat & Devices, Beijing, Peoples R China Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R ChinaLiu, Fengqi论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R China Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R ChinaLi, Baiquan论文数: 0 引用数: 0 h-index: 0机构: Beijing Huajin Chuangwei Technol Co Ltd, Beijing, Peoples R China Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R ChinaWang, Zhanguo论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R China Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100864, Peoples R China
- [50] Analysis of slow-current transients or current collapse in AlGaN/GaN HEMTs with field plate and high-k passivation layerMICROELECTRONICS RELIABILITY, 2022, 134Komoto, Kazuki论文数: 0 引用数: 0 h-index: 0机构: Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, JapanSaito, Yasunori论文数: 0 引用数: 0 h-index: 0机构: Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, JapanTsurumaki, Ryouhei论文数: 0 引用数: 0 h-index: 0机构: Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, JapanHorio, Kazushige论文数: 0 引用数: 0 h-index: 0机构: Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, 307 Fukasaku, Saitama 3378570, Japan