Three-dimensional additive electron-beam lithography

被引：2
作者：
Koops, HWP [1 ]
Weber, M [1 ]
Schossler, C [1 ]
Kaja, A [1 ]
机构：
[1] DEUTSCHE TELEKOM AG,FORSCH & TECHNOL ZENTRUM,D-64295 DARMSTADT,GERMANY
来源：
METAL/NONMETAL MICROSYSTEMS: PHYSICS, TECHNOLOGY, AND APPLICATIONS | 1996年 / 2780卷
关键词：
three dimensional; additive lithography; electron-beam induced deposition; nanocrystalline tips; tip-array; supertip; field emission; micro-tube; photon crystal; nanostructures; coulomb blockade;
D O I：
10.1117/12.238195
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：388 / 395
页数：8
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