Evaluation of structural, electronic, thermoelectric, and optical results of C-doped HfO2 by first-principle's investigation

被引:18
作者
Cao, Zhenheng [1 ,2 ]
Fan, Ting [3 ]
Hou, Xueyuan [1 ,2 ]
Niu, Jiajia [4 ]
Sharma, Ramesh [5 ]
Dar, Sajad Ahmad [6 ]
机构
[1] Yanan Univ, Sch Chem & Chem Engn, Yanan 716000, Peoples R China
[2] Shaanxi Key Lab Chem React Engn, Yanan City 716000, Peoples R China
[3] Jiangxi Univ Engn, Sch New Energy & Environm Engn, Xinyu City 330046, Peoples R China
[4] Yanan Univ, Sch Chem & Chem Engn, Yanan City 716000, Peoples R China
[5] Feroze Gandhi Inst Engn & Technol, Dept Appl Sci, Raebareli 229001, UP, India
[6] Govt Motilal Vigyan Mahavidyalya Coll, Dept Phys, Bhopal 462008, Madhya Pradesh, India
关键词
electronic properties; optical; phonon calculations; structural properties; thermoelectric; ATOMIC LAYER DEPOSITION; ELECTRICAL-PROPERTIES; HYDROGEN-PRODUCTION; ZRO2; NANOPARTICLES; HAFNIA; PHOTOLUMINESCENCE; OXIDATION; FILMS; NIO;
D O I
10.1002/er.4878
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
In this work, we report the ab initio numerical simulation investigation on the crystal lattice, electronic structure, optical, and transport properties of pure and C-doped crystalline hafnium dioxide (c-HfO2) using FP-LAPW method. Different exchange correlation functionals like generalized gradient approximation (GGA) of PBE-sol and Tran and Blaha's modified Becke-Johnson exchange potential (mBJ) within density functional theory have been used. Two kinds of defects in cubic pure HfO2 have been investigated: one is substitution of Hf atom by C impurity and other substitution of O atom by C impurity in crystalline HfO2. The computed results indicate that impurity energy bands as a result of 2p states of C are found to present in the band gap of c-HfO2. Few of these bands are present at the conduction band minimum, which results to a noteworthy band gap contraction, and hence electrons close to Fermi level get transferred in doped c-HfO2. We have also analysed the dielectric function, absorption coefficient, optical conductivity, optical function, electron energy loss, and reflectivity for both pure HfO2 and doped with C. Furthermore, the temperature-dependent transport properties of C-doped HfO2 are also discussed in terms of Seeback coefficient, thermal conductivities, electronic conductivities, power factor, and figure of merit in the temperature range 0 to 1200 K. The calculated value of PF for pure HfO2 was found to increase from 0.01 x 10(12) WK(-2)m(-1)s(-1) at 50 K to 1.79 x 10(12) WK(-2)m(-1)s(-1) at 1200 K and for HfO2(1 - x)Cx it was found to increase from 0.06 x 10(12) WK(-2)m(-1)s(-1) at 50 K to 0.25 x 10(12) WK(-2)m(-1)s(-1) at 1200 K.
引用
收藏
页码:144 / 157
页数:14
相关论文
共 56 条
[1]   X-RAY-DIFFRACTION STUDY OF HAFNIA UNDER HIGH-PRESSURE USING SYNCHROTRON RADIATION [J].
ADAMS, DM ;
LEONARD, S ;
RUSSELL, DR ;
CERNIK, RJ .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1991, 52 (09) :1181-1186
[2]   Linear optical properties of solids within the full-potential linearized augmented planewave method [J].
Ambrosch-Draxl, Claudia ;
Sofo, Jorge O. .
COMPUTER PHYSICS COMMUNICATIONS, 2006, 175 (01) :1-14
[3]  
[Anonymous], 2008, Augmented Plane Wave Plus Local Orbitals Program for Calculating Crystal Properties
[4]   The effects of alloying element Co on Ni-Mn-Ga ferromagnetic shape memory alloys from first-principles calculations [J].
Bai, Jing ;
Raulot, Jean-Marc ;
Zhang, Yudong ;
Esling, Claude ;
Zhao, Xiang ;
Zuo, Liang .
APPLIED PHYSICS LETTERS, 2011, 98 (16)
[5]   Promising materials for thermoelectric applications [J].
Cai, Bowen ;
Hu, Haihua ;
Zhuang, Hua-Lu ;
Li, Jing-Feng .
JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 806 :471-486
[6]   Ab initio localized basis set study of structural parameters and elastic properties of HfO2 polymorphs [J].
Caravaca, MA ;
Casali, RA .
JOURNAL OF PHYSICS-CONDENSED MATTER, 2005, 17 (37) :5795-5811
[7]   High-κ/metal-gate stack and its MOSFET characteristics [J].
Chau, R ;
Datta, S ;
Doczy, M ;
Doyle, B ;
Kavalieros, J ;
Metz, M .
IEEE ELECTRON DEVICE LETTERS, 2004, 25 (06) :408-410
[8]   Effects of carbon residue in atomic layer deposited HfO2 films on their time-dependent dielectric breakdown reliability [J].
Cho, Moonju ;
Kim, Jeong Hwan ;
Hwang, Cheol Seong ;
Ahn, Hyo-Shin ;
Han, Seungwu ;
Won, Jeong Yeon .
APPLIED PHYSICS LETTERS, 2007, 90 (18)
[9]   Material and electrical characterization of carbon-doped Ta2O5 films for embedded dynamic random access memory applications [J].
Chu, K ;
Chang, JP ;
Steigerwald, ML ;
Fleming, RM ;
Opila, RL ;
Lang, DV ;
Van Dover, RB ;
Jones, CDW .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (01) :308-316
[10]   Electrical properties of HfO2 deposited via atomic layer deposition using Hf(NO3)4 and H2O [J].
Conley, JF ;
Ono, Y ;
Solanki, R ;
Stecker, G ;
Zhuang, W .
APPLIED PHYSICS LETTERS, 2003, 82 (20) :3508-3510