Pulsed laser-ablated MoS2-Al films:: friction and wear in humid conditions

被引:64
作者
Nainaparampil, JJ
Phani, AR
Krzanowski, JE
Zabinski, JS
机构
[1] USAF, Res Lab, Wright Patterson AFB, Dayton, OH 45433 USA
[2] Univ New Hampshire, Dept Mech Engn, Durham, NH 03824 USA
关键词
pulsed laser deposition; molybdenum disulphide; X-ray diffraction spectroscopy; aluminum; tribology;
D O I
10.1016/j.surfcoat.2004.02.043
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The application of MoS2 as a solid lubricant in dry conditions is well established, but the presence of humidity degrades the tribological behavior of MoS2 films. There has been much progress toward increasing the efficiency of MoS2 films in humid environments by using various additives. In our work, aluminum is evaluated as an additive because of its affinity for O-2 and (OH) compared to Mo and its potential to modify transfer film formation. The MoS2 films examined here were deposited on 440C steel substrates by laser ablation along with simultaneous magnetron sputtering of Al. The friction and wear studies were made on a ball on disc tribometer. Films containing Al outperformed pure MoS2. Under optimal conditions, 1-2-mum-thick films with similar to 8% aluminum had a wear life of 150 to 250 K cycles in 25% humidity. Micro-Raman and X-ray photoelectron spectroscopy (XPS) were used to analyze chemistry and scanning electron microscopy (SEM) was used to study the morphology and film cross-section. Nanoindentation showed that Al addition did not increase film hardness. The role of aluminum in increasing the wear life of laser-ablated MoS2 films in humid conditions is discussed. The mechanism controlling the increased wear life is partially explained by showing that Al is gradually turned into alumina, creating an adhesive and lubricating mix of wear debris under tribostress in humid surroundings. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:326 / 335
页数:10
相关论文
共 42 条
[1]  
BARTZ WJ, 1986, LUBR ENG, V42, P762
[2]   PREPARATION BY ION-BEAM-ASSISTED DEPOSITION, ANALYSIS AND TRIBOLOGICAL BEHAVIOR OF MOS2 FILMS [J].
BOLSTER, RN ;
SINGER, IL ;
WEGAND, JC ;
FAYEULLE, S ;
GOSSETT, CR .
SURFACE & COATINGS TECHNOLOGY, 1991, 46 (02) :207-216
[3]   MORPHOLOGICAL PROPERTIES OF SPUTTERED MOS2 FILMS [J].
BUCK, V .
WEAR, 1983, 91 (03) :281-288
[4]   STRUCTURE AND DENSITY OF SPUTTERED MOS2-FILMS [J].
BUCK, V .
VACUUM, 1986, 36 (1-3) :89-94
[5]   A NEGLECTED PARAMETER (WATER CONTAMINATION) IN SPUTTERING OF MOS2 FILMS [J].
BUCK, V .
THIN SOLID FILMS, 1986, 139 (02) :157-168
[6]   TRIBOLOGICAL PERFORMANCE OF MOS2 COMPACTS CONTAINING SULFUR, SB2S3 OR SB2S4 [J].
CENTERS, PW ;
PRICE, FD .
WEAR, 1989, 129 (02) :205-213
[7]   ENHANCEMENT OF SLIDING LIFE OF MOS2 FILMS DEPOSITED BY COMBINING SPUTTERING AND HIGH-ENERGY ION-IMPLANTATION [J].
CHEVALLIER, J ;
OLESEN, S ;
SORENSEN, G ;
GUPTA, B .
APPLIED PHYSICS LETTERS, 1986, 48 (13) :876-877
[8]  
DIDZIULIS SV, 1993, SURFACE DIAGNOSTICS, P135
[9]   DEPOSITION AND PROPERTIES OF MOS2 THIN-FILMS GROWN BY PULSED LASER EVAPORATION [J].
DONLEY, MS ;
MURRAY, PT ;
BARBER, SA ;
HAAS, TW .
SURFACE & COATINGS TECHNOLOGY, 1988, 36 (1-2) :329-340
[10]   SUPERFLOW FRICTION OF OXYGEN-FREE MOS2 COATINGS IN ULTRAHIGH-VACUUM [J].
DONNET, C ;
LEMOGNE, T ;
MARTIN, JM .
SURFACE & COATINGS TECHNOLOGY, 1993, 62 (1-3) :406-411