Properties of ITO films deposited by r.f.-PERTE on unheated polymer substrates-dependence on oxygen partial pressure

被引：38
作者：
de Carvalho, CN
Lavareda, G
Fortunato, E
Amaral, A
机构：
[1] Univ Nova Lisboa, FCT, Dept Ciencia Mat, P-2829516 Caparica, Portugal
[2] IST, Ctr Fis Mol, P-1049001 Lisbon, Portugal
[3] IST, Dept Fis, P-1049001 Lisbon, Portugal
来源：
THIN SOLID FILMS | 2003年 / 427卷 / 1-2期
关键词：
indium tin oxide; r.f.-plasma enhanced reactive thermal evaporation; polymer substrates; room temperature; oxygen partial pressure;
D O I：
10.1016/S0040-6090(02)01213-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The study of the influence of oxygen partial pressure on the properties of indium. tin oxide (ITO) thin films deposited onto polymer substrates at room temperature is presented. Two types of polymer substrates were used: polyethylene terephthalate (PET) and polyethylene naphathalate (PEN). The deposition technique used is the radio frequency plasma enhanced reactive thermal evaporation of a 90% In-10% Sn alloy in the presence of oxygen. The oxygen partial pressure varied between 2 X 10(-4) and 4 X 10(-3) mbar and the average thickness of the films is approximate to40 nm. Results show that ITO thin films deposited on polyester (PET) at the optimum oxygen partial pressure of 6 X 10(-4) mbar exhibit the following characteristics: an average total visible transmittance of 80% and an electrical resistivity of 1.9 X 10(-2) Ohm cm. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：215 / 218
页数：4
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