Nonlinear analysis of pattern formation in singly resonant second-harmonic generation

被引：12
|
作者：
Lodahl, P
Saffman, M
机构：
[1] Riso Natl Lab, Dept Opt & Fluid Dynam, DK-4000 Roskilde, Denmark
[2] Univ Wisconsin, Dept Phys, Madison, WI 53706 USA
来源：
OPTICS COMMUNICATIONS | 2000年 / 184卷 / 5-6期
关键词：
nonlinear optics; pattern formation;
D O I：
10.1016/S0030-4018(00)00971-8
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A weakly nonlinear multiple-scales analysis is performed for singly resonant second-harmonic generation. Coupled amplitude equations are derived that describe pattern formation above the transverse instability threshold. The amplitude equations explain the absence of roll patterns and are in good agreement with numerical results. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：493 / 505
页数：13
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