Silicon-Based Target Materials for Large-Area Sputtering Applications

被引：0
|
作者：
Simons, C. [1 ]
Kastner, A. [1 ]
Klotz, T. [1 ]
Wagner, J. [1 ]
机构：
[1] Heraeus Deutschland Gmbh & Co KG, Hanau, Germany
来源：
SOCIETY OF VACUUM COATERS 59TH ANNUAL TECHNICAL CONFERENCE PROCEEDINGS, 2016 | 2016年
关键词：
D O I：
10.14332/svc16.proc.0026
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Si:Al and Si:TiOx targets with a wide alloy range were reactively sputtered. The sputtering behavior is analyzed with respect to the content of Al and TiOx. Cathode voltage, reactive gas flow, dynamic deposition rate, and hysteresis curves are also compared. In addition, the influence of the deposited alloy on the refractive index and on wear behavior is briefly discussed.
引用
收藏
页码：196 / 202
页数：7
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