Spontaneous oxygen loading into SiO2 glass by thermal anneal

被引：20

作者：

Kajihara, K

Miura, T

Kamioka, H

Hirano, M

Skuja, L

Hosono, H

机构：

[1] Japan Sci & Technol Agcy, SORST, Midori Ku, Yokohama, Kanagawa 2268503, Japan

[2] RIKEN, Solid State Opt Sci Res Unit, Wako, Saitama 3510198, Japan

[3] Latvian State Univ, Inst Solid State Phys, LV-1063 Riga, Latvia

[4] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 2004年 / 349卷

关键词：

D O I：

10.1016/j.jnoncrysol.2004.08.143

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The interstitial oxygen molecules (O-2) in SiO2 glass were detected down to similar to10(15)cm(-3) by photoluminescence of O-2 at 1272 nm excited at 765 nm by a continuous-wave titanium sapphire laser. It was evidenced that SiO2 glass thermally annealed in air between 800 and 1100degreesC spontaneously absorbs similar to10(16)cm(-3) of O-2 from the ambient atmosphere. The time-dependent concentration change of the interstitial O-2 allows the determination of both the diffusion coefficient and the solubility of the interstitial O-2. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：205 / 208

页数：4

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