Spontaneous oxygen loading into SiO2 glass by thermal anneal

被引：20
作者：
Kajihara, K
Miura, T
Kamioka, H
Hirano, M
Skuja, L
Hosono, H
机构：
[1] Japan Sci & Technol Agcy, SORST, Midori Ku, Yokohama, Kanagawa 2268503, Japan
[2] RIKEN, Solid State Opt Sci Res Unit, Wako, Saitama 3510198, Japan
[3] Latvian State Univ, Inst Solid State Phys, LV-1063 Riga, Latvia
[4] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 2004年 / 349卷
关键词：
D O I：
10.1016/j.jnoncrysol.2004.08.143
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The interstitial oxygen molecules (O-2) in SiO2 glass were detected down to similar to10(15)cm(-3) by photoluminescence of O-2 at 1272 nm excited at 765 nm by a continuous-wave titanium sapphire laser. It was evidenced that SiO2 glass thermally annealed in air between 800 and 1100degreesC spontaneously absorbs similar to10(16)cm(-3) of O-2 from the ambient atmosphere. The time-dependent concentration change of the interstitial O-2 allows the determination of both the diffusion coefficient and the solubility of the interstitial O-2. (C) 2004 Elsevier B.V. All rights reserved.
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页码：205 / 208
页数：4
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