Temperature dependence of electron concentration and mobility in n-GaN measured up to 1020 K

被引:13
作者
Tokuda, H. [1 ]
Kodama, K. [1 ]
Kuzuhara, M. [1 ]
机构
[1] Univ Fukui, Dept Elect & Elect Engn, Fukui 9108507, Japan
关键词
conduction bands; dislocation structure; doping profiles; electron mobility; elemental semiconductors; gallium compounds; Hall mobility; III-V semiconductors; impurity states; semiconductor doping; silicon; wide band gap semiconductors; THREADING EDGE DISLOCATION; MOLECULAR-BEAM EPITAXY; VAPOR-PHASE EPITAXY; GALLIUM NITRIDE; YELLOW LUMINESCENCE; OPTICAL-PROPERTIES; RAMAN-SCATTERING; OXYGEN; SHALLOW; VACANCIES;
D O I
10.1063/1.3456560
中图分类号
O59 [应用物理学];
学科分类号
摘要
Temperature dependence of Hall electron concentration and mobility in n-GaN has been measured up to 1020 K. The electron concentration increased monotonically with temperature and did not saturate. The measured values were fitted with the calculated ones for the whole temperature range. It is found that following two assumptions have to be made in order to obtain the best fit for both electron concentration and mobility: (i) two donor levels and one acceptor level (including dislocation) have to be taken into account; and (ii) one donor level lies in the conduction band. The obtained results in this study will contribute to the design of GaN devices operating at high temperatures. (C) 2010 American Institute of Physics. [doi:10.1063/1.3456560]
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页数:3
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