Design of a novel structure capacitive RF MEMS switch to improve performance parameters

被引:25
|
作者
Kondaveeti, Girija Sravani [1 ,2 ]
Guha, Koushik [1 ]
Karumuri, Srinivasa Rao [2 ]
Elsinawi, Ameen [3 ]
机构
[1] Natl Inst Technol, Dept ECE, Silchar 788010, Assam, India
[2] Deemed Be Univ, Dept ECE, Koneru Lakshmaih Educ Fdn, Guntur, Andhra Pradesh, India
[3] Khalifa Univ, Dept Mech Engn, Abu Dubai, U Arab Emirates
关键词
microwave switches; microswitches; gold; silicon compounds; radiofrequency integrated circuits; Q-factor; dielectric materials; pull-in voltage; low insertion loss; high capacitance ratio; upstate capacitance; low return loss; downstate capacitance; uniform single meander; central beam; step-down structure; stress analysis; RF analysis; gold material; quality factor; RF microelectromechanical system; capacitive RF MEMS switch; silicon nitride; K-band satellite applications; frequency; 28; 2; GHz; capacitance; 56; 8; pF; 7; Si3N4; Au;
D O I
10.1049/iet-cds.2019.0206
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This study reports the design and analysis of novel step structure RF micro-electromechanical system (MEMS) switch for low pull-in voltage, low insertion loss and high isolation by using uniform single meander. The central beam of the membrane is designed with 0.5 mu m lower than the side beams to form a step-down structure which reduces the pull-in voltage. Stress analysis, electromechancial, switching time, quality factor and RF analysis have done to understand the behavioural characteristics of the proposed step-down switch. The analysis has been carried out for different beam and dielectric materials among them switch with gold material exhibits low pull-in voltage of 4.7 V, low insertion loss <1 dB and high isolation of -38.3 dB at 28.2 GHz for silicon nitride. The switch also shows good quality factor of 0.95 for gold material along with high capacitance ratio of 132. The upstate capacitance of 56.8 pF contributes low return loss and made the switch to transmit the signal up to 26.2 GHz and provides 7.2 pF of downstate capacitance to produce high isolation at 26.2 GHz which is efficiently used for K-band satellite applications.
引用
收藏
页码:1093 / 1101
页数:9
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