Deposition of complex multielemental thin films

被引:133
作者
Willmott, PR
机构
[1] Paul Scherrer Inst, Swiss Litht Source, CH-5232 Villigen, Switzerland
[2] Univ Zurich, Inst Phys Chem, CH-8057 Zurich, Switzerland
关键词
pulsed laser deposition; magnetron sputtering; thin films; materials science; surface science; perovskites; complex metal oxides; carbides; nitrides; alloys;
D O I
10.1016/j.progsurf.2004.06.001
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Modern condensed-matter physics is increasingly concerned with the design, synthesis, analysis, and exploitation of chemically complex materials and structures. Complex metal oxides and strongly correlated electron systems such as YBa2Cu3O7-x and La1-xSrxMnO3 are paradigmatic examples. Their production in the form of high-quality thin films is of both technological and fundamental importance and has stimulated a concerted effort in the last two decades to find and optimize efficient techniques to this end. This review discusses the physics behind and the requirements for synthesizing high-quality films of such materials and examines fundamental aspects of the growth processes associated with magnetron sputtering and pulsed laser deposition, the two techniques which presently offer the best solutions in this burgeoning field. (C) 2004 Elsevier Ltd. All rights reserved.
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页码:163 / 217
页数:55
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