Well-ordered perpendicular cylinders of star-block copolymers (BCPs) composed of polystyrene and poly(dimethylsiloxane) blocks with high aspect ratio can be achieved by using a combination of architecture effect (entropy effect) and surface air plasma treatment (enthalpy effect). An interesting morphological evolution from disordered texture to hexagonally packed cylinders with perpendicular orientation has been observed, in which perpendicular cylinders are initiated at the top surface and bottom substrate of the thin film, followed by a self-alignment process, resulting in span-thru cylinders through the thin film. The self-alignment process is systematically examined by a combination of real space imaging using transmission electron microscopy, reciprocal space imaging using grazing incidence small-angle X-ray scattering, and three-dimensional tomography. The experimental results reveal a unique mechanism for the formation of highly ordered BCP thin films via surface-induced nucleation of perpendicularly oriented cylinders followed by lateral ordering of the cylinders. This discovery provides an insight into the mechanisms of confined self-assembly of BCP for the engineering of nanostructured thin films with controlled orientation and long-range order.
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Univ Wisconsin, Dept Elect & Comp Engn, Madison, WI 53706 USAUniv Wisconsin, Dept Elect & Comp Engn, Madison, WI 53706 USA
Chang, Tzu-Hsuan
Xiong, Shisheng
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Univ Chicago, Inst Mol Engn, Chicago, IL 60637 USAUniv Wisconsin, Dept Elect & Comp Engn, Madison, WI 53706 USA
Xiong, Shisheng
Liu, Chi-Chun
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Univ Chicago, Inst Mol Engn, Chicago, IL 60637 USA
IBM Albany Nanotech Res Ctr, Albany, NY 12203 USAUniv Wisconsin, Dept Elect & Comp Engn, Madison, WI 53706 USA
Liu, Chi-Chun
Liu, Dong
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Univ Wisconsin, Dept Elect & Comp Engn, Madison, WI 53706 USAUniv Wisconsin, Dept Elect & Comp Engn, Madison, WI 53706 USA
Liu, Dong
Nealey, Paul F.
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Univ Chicago, Inst Mol Engn, Chicago, IL 60637 USAUniv Wisconsin, Dept Elect & Comp Engn, Madison, WI 53706 USA
Nealey, Paul F.
Ma, Zhenqiang
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Univ Wisconsin, Dept Elect & Comp Engn, Madison, WI 53706 USAUniv Wisconsin, Dept Elect & Comp Engn, Madison, WI 53706 USA
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Hong Kong Polytech Univ, Inst Text & Clothing, Nanotechnol Ctr, Kowloon, Hong Kong, Peoples R ChinaHong Kong Polytech Univ, Inst Text & Clothing, Nanotechnol Ctr, Kowloon, Hong Kong, Peoples R China
Gong, Jianliang
Xu, Bingang
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Hong Kong Polytech Univ, Inst Text & Clothing, Nanotechnol Ctr, Kowloon, Hong Kong, Peoples R ChinaHong Kong Polytech Univ, Inst Text & Clothing, Nanotechnol Ctr, Kowloon, Hong Kong, Peoples R China
Xu, Bingang
Tao, Xiaoming
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Hong Kong Polytech Univ, Inst Text & Clothing, Nanotechnol Ctr, Kowloon, Hong Kong, Peoples R ChinaHong Kong Polytech Univ, Inst Text & Clothing, Nanotechnol Ctr, Kowloon, Hong Kong, Peoples R China
Tao, Xiaoming
Li, Lei
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Xiamen Univ, Coll Mat, Xiamen 361005, Peoples R ChinaHong Kong Polytech Univ, Inst Text & Clothing, Nanotechnol Ctr, Kowloon, Hong Kong, Peoples R China