GaAs under intense ultrafast excitation: Response of the dielectric function

被引:179
作者
Huang, L
Callan, JP
Glezer, EN
Mazur, E
机构
[1] Harvard Univ, Dept Phys, Cambridge, MA 02138 USA
[2] Harvard Univ, Div Engn & Appl Sci, Cambridge, MA 02138 USA
关键词
D O I
10.1103/PhysRevLett.80.185
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We used a new broadband spectroscopic technique to measure the dielectric function of GaAs over the spectral range of 1.5-3.5 eV following intense 70-fs laser excitation. The results provide the most detailed information thus far on the electron and lattice dynamics both above and below the fluence threshold for permanent damage, F-th = 1.0 kJ/m(2). There are three distinct regimes of behavior: lattice heating (<0.5F(th)), lattice disordering (0.6-0.8)F-th, and a semiconductor-to-metal transition (>0.8F(th)). Below F-th, the changes are completely reversible.
引用
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页码:185 / 188
页数:4
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