Synthesis, characterization and surface reactivity of tungsten carbide (WC) PVD films

被引：35

作者：

Zellner, MB

Chen, JG ^{[1
]}

机构：

[1] Univ Delaware, CCST, Dept Chem Engn, Newark, DE 19716 USA

[2] Univ Delaware, CCST, Dept Mat Sci & Engn, Newark, DE 19716 USA

来源：

SURFACE SCIENCE | 2004年 / 569卷 / 1-3期

基金：

美国国家航空航天局;

关键词：

tungsten; carbides; electron energy loss spectroscopy (EELS); thermal desorption; near edge extended X-ray absorption; fine structure (NEXAFS);

D O I：

10.1016/j.susc.2004.07.029

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Phase-pure tungsten carbide (WC) and Pt-modified WC thin films have been synthesized using the physical vapor deposition (PVD) technique. The physical and chemical properties of the PVD films have been studied using high-resolution electron energy loss spectroscopy (HREELS), X-ray photoelectron spectroscopy (XPS), temperature programmed desorption (TPD), and near edge X-ray adsorption fine structure (NEXAFS). TPD and HREELS have been utilized to investigate the reactivity of the WC and Pt-modified WC films toward the reaction with cyclohexene. The addition of Pt on the WC surface enhances the selective dehydrogenation pathway to produce gas phase benzene. The results reported here illustrate the feasibility of utilizing TPD and HREELS to investigate the surface chemistry of well-characterized PVD films. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：89 / 98

页数：10

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