DESIGN OF SHALLOW p-TYPE DOPANTS IN ZnO

被引:0
|
作者
Wei, Su-Huai [1 ]
Li, Jingbo [1 ]
Yan, Y. [1 ]
机构
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
来源
PVSC: 2008 33RD IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE, VOLS 1-4 | 2008年
关键词
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Due to the large electronegativity of the oxygen, the ionization energies of acceptors in metal oxides such as ZnO is quite high, making p-type doping a great challenge for the full utilization of ZnO as optoelectronic materials. By analyzing the defect wavefunction characters, we propose several approaches to lower the acceptor ionization energy in ZnO by codoping acceptors with donor or isovalent atoms. We also proposed a universal approach to overcome the doping polarity problem for wide-band-gap semiconductors. This approach can reduce the ionization energies of dopants and the spontaneous compensation from intrinsic defects by effective doping of impurity bands, which can be achieved by introducing passive donor-acceptor complexes or isovalent impurities. The approaches described here for ZnO can be easily extended to other transparent conducting oxides used for solar cell applications.
引用
收藏
页码:49 / 52
页数:4
相关论文
共 50 条
  • [1] Location of P and As dopants and p-type doping of ZnO
    Fons, P.
    Kolobov, A. V.
    Tominaga, Junji
    Hyot, Berangere
    Andre, Bernard
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2014, 16 (1-2): : 1 - 5
  • [2] Shallow acceptor complexes in p-type ZnO
    Reynolds, J. G.
    Reynolds, C. L., Jr.
    Mohanta, A.
    Muth, J. F.
    Rowe, J. E.
    Everitt, H. O.
    Aspnes, D. E.
    APPLIED PHYSICS LETTERS, 2013, 102 (15)
  • [3] Behavior of p-type dopants in HgCdTe
    M. A. Berding
    A. Sher
    M. Van Schilfgaarde
    Journal of Electronic Materials, 1997, 26 : 625 - 628
  • [4] Behavior of p-type dopants in HgCdTe
    Berding, MA
    Sher, A
    VanSchilfgaarde, M
    JOURNAL OF ELECTRONIC MATERIALS, 1997, 26 (06) : 625 - 628
  • [5] p-Type ZnO
    不详
    AMERICAN CERAMIC SOCIETY BULLETIN, 2005, 84 (03): : 4 - 4
  • [6] Materials design for the fabrication of p-type ZnO by codoping method
    Yamamoto, T
    Katayama-Yoshida, H
    PROCEEDINGS OF THE 25TH INTERNATIONAL CONFERENCE ON THE PHYSICS OF SEMICONDUCTORS, PTS I AND II, 2001, 87 : 1409 - 1410
  • [7] Design of a shallow thermally stable ohmic contact to p-type InGaSb
    Wang, SH
    Mohney, SE
    Hull, BA
    Bennett, BR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (02): : 633 - 640
  • [8] SHALLOW ACCEPTORS AND P-TYPE ZNSE
    KOSAI, K
    FITZPATRICK, BJ
    GRIMMEISS, HG
    BHARGAVA, RN
    NEUMARK, GF
    APPLIED PHYSICS LETTERS, 1979, 35 (02) : 194 - 196
  • [9] Interaction of p-type dopants during diffusion in InP
    Tuck, B
    Shepherd, FR
    Kelly, G
    Margittai, A
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2000, 15 (03) : 254 - 258
  • [10] COMPARISON OF THE P-TYPE DOPANTS K AND N IN ZNSE
    STEWART, H
    SIMPSON, J
    WANG, SY
    HAUKSSON, I
    ADAMS, SJA
    PRIOR, KA
    CAVENETT, BC
    JOURNAL OF CRYSTAL GROWTH, 1993, 127 (1-4) : 379 - 382