Integration of InAlAs/InGaAs/InP enhancement- and depletion-mode high electron mobility transistors for high-speed circuit applications

被引:16
|
作者
Mahajan, A [1 ]
Fay, P
Arafa, M
Adesida, I
机构
[1] Univ Illinois, Ctr Compound Semicond Microelect, Urbana, IL 61801 USA
[2] Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USA
关键词
D O I
10.1109/16.658854
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A process for the monolithic integration of enhancement- and depletion-mode high electron mobility transistors (E/D-HEMT's) on InAlAs/InGaAs/InP is reported. The E-HEMT's with a 1.0-mu m gate length exhibit a threshold voltage of +255 mV and a maximum de extrinsic transconductance of 503 mS/mm at room temperature, while a threshold voltage of -317 mV and a transconductance of 390 mS/mm are measured for the D-HEMT's of the same gate length. The devices show excellent RP performance, with a unity current-gain cutoff frequency (f(t)) of 35 GHz and a maximum frequency of oscillation (f(max)) of 95 GHz for both the E-and D-HEMT's, To the best of the authors' knowledge, this is the first demonstration of an E/D-HEMT technology on lattice-matched InP that is suitable for circuit integration.
引用
收藏
页码:338 / 340
页数:3
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