A microstructural study of annealed Ti/Co/Cu/Co/MnFe/Ti spin-valve films

被引:7
作者
Portier, X
Petford-Long, AK
Bayle-Guillemaud, P
Anthony, TC
Brug, JA
机构
[1] Univ Oxford, Dept Mat, Oxford OX1 3PH, England
[2] Hewlett Packard Labs, Palo Alto, CA 94304 USA
关键词
D O I
10.1063/1.120662
中图分类号
O59 [应用物理学];
学科分类号
摘要
Spin-valve properties are adversely affected by heat treatments and in order to study this effect, microstructural analyses of Ti/Co/Cu/Co/MnFe/Ti spin-valve films annealed at 225 and at 290 degrees C have been performed. Whereas the lower temperature tends to optimize the giant magnetoresistance (GMR) ratio, the higher temperature induces a significant decrease in the GMR ratio (from 7.5% to 5.2%). High resolution electron microscopy studies have explained this result as being due to the formation of a TiCo alloy at the Ti/Co interface and to a decrease in the thickness of the sense layer. No significant modification of either the Co/Cu or the Cu/Co interfaces has been observed. (C) 1998 American Institute of Physics.
引用
收藏
页码:118 / 120
页数:3
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