Planar S-F-S Josephson junctions made by focused ion beam etching

被引:18
|
作者
Krasnov, VM [1 ]
Ericsson, O
Intiso, S
Delsing, P
Oboznov, VA
Prokofiev, AS
Ryazanov, VV
机构
[1] Chalmers Univ Technol, Dept Microtechnol & Nanosci, SE-41296 Gothenburg, Sweden
[2] Russian Acad Sci, Inst Solid State Phys, Chernogolovka 142432, Russia
来源
关键词
Josephson junctions; superconductor-ferromagnet-superconductor structures; focused ion beam etching;
D O I
10.1016/j.physc.2004.11.004
中图分类号
O59 [应用物理学];
学科分类号
摘要
Superconductor-ferromagnet-superconductor (S-F-S) Josephson junctions were fabricated by making a narrow cut through a S-F double layer using direct writing by focused ion beam (FIB). Due to a high resolution (spot size smaller than 10 nm) of FIB, junctions with a small separation between superconducting electrodes (less than or equal to 30 nm) can be made. Such a short distance is sufficient for achieving a considerable proximity coupling through a diluted CuNi ferromagnet. We have successfully fabricated and studied S-F-S (Nb-CuNi-Nb) and S-S'-S (Nb-Nb/CuNi-Nb) junctions. Junctions exhibit clear Fraunhofer modulation of the critical current as a function of magnetic field, indicating good uniformity of the cut. By changing the depth of the cut, junctions with the IcRn product ranging from 0.5 mV to similar to1 muV were fabricated. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:16 / 22
页数:7
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