Electron beam evaporated LaF3 thin films prepared by different temperatures and deposition rates

被引：13

作者：

Liu, Guanghui ^{[1
]}

He, Hongbo ^{[1
]}

Jin, Yunxia ^{[1
]}

Fan, Zhengxiu ^{[1
]}

机构：

[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Lasers, Shanghai 201800, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 2010年 / 256卷 / 08期

关键词：

LaF3; films; Electron beam evaporation; Microstructure; Refractive index; LIDT; 193; NM; OPTICAL-PROPERTIES;

D O I：

10.1016/j.apsusc.2009.10.064

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

LaF3 thin films were prepared by electron beam evaporation with different temperatures and deposition rates. Microstructure properties including crystalline structure and surface roughness were investigated by X-ray diffraction (XRD) and optical profilograph. X-ray photoelectron spectroscopy (XPS) was employed to study the chemical composition of the films. Optical properties (transmittance and refractive index) and laser induce damage threshold (LIDT) at 355 nm of the films were also characterized. The effects of deposition rate and substrate temperature on microstructure, optical properties and LIDT of LaF3 thin films were discussed, respectively. (C) 2009 Elsevier B. V. All rights reserved.

引用

页码：2343 / 2346

页数：4