Enhanced interfacial electronic transfer of BiVO4 coupled with 2D g-C3N4 for visible-light photocatalytic performance

被引:14
作者
Xu, Min [1 ]
Zhu, Yan [2 ]
Yang, Jingkai [1 ,3 ]
Li, Wei [4 ]
Sun, Chaoyang [1 ]
Cui, Yan [1 ]
Liu, Lu [1 ]
Zhao, Hongli [1 ]
Liang, Bo [1 ]
机构
[1] Yanshan Univ, Coll Mat Sci & Engn, State Key Lab Metastable Mat Sci & Technol, Qinhuangdao, Hebei, Peoples R China
[2] Hebei Normal Univ Sci Technol, Dept Phys, Qinhuangdao, Hebei, Peoples R China
[3] Yanshan Univ, Key Lab Green Construct & Intelligent Maintenance, Qinhuangdao, Hebei, Peoples R China
[4] Univ Edinburgh, Inst Mat & Proc, Sch Engn, Edinburgh, Midlothian, Scotland
基金
中国国家自然科学基金;
关键词
BiVO4; built‐ in electric field; g‐ C3N4; nanosheet; interfacial electronic effects; photocatalytic degradation; GRAPHITIC CARBON NITRIDE; Z-SCHEME HETEROJUNCTION; EFFICIENT; DEGRADATION; NANOSHEETS; EVOLUTION; HETEROSTRUCTURES; NANOPARTICLES; ARCHITECTURES; CONSTRUCTION;
D O I
10.1111/jace.17740
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A BiVO4/2D g-C3N4 direct dual semiconductor photocatalytic system has been fabricated via electrostatic self-assembly method of BiVO4 microparticle and g-C3N4 nanosheet. According to experimental measurements and first-principle calculations, the formation of built-in electric field and the opposite band bending around the interface region in BiVO4/2D g-C3N4 as well as the intimate contact between BiVO4 and 2D g-C3N4 will lead to high separation efficiency of charge carriers. More importantly, the intensity of bulid-in electric field is greatly enhanced due to the ultrathin nanosheet structure of 2D g-C3N4. As a result, BiVO4/2D g-C3N4 exhibits excellent photocatalytic performance with the 93.0% Rhodamine B (RhB) removal after 40 min visible light irradiation, and the photocatalytic reaction rate is about 22.7 and 10.3 times as high as that of BiVO4 and 2D g-C3N4, respectively. In addition, BiVO4/2D g-C3N4 also displays enhanced photocatalytic performance in the degradation of tetracycline (TC). It is expected that this work may provide insights into the understanding the significant role of built-in electric field in heterostructure and fabricating highly efficient direct dual semiconductor systems.
引用
收藏
页码:3004 / 3018
页数:15
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