Combined impulse-stationary impulse plasma deposition

In order to increase the capabilities of the IPD method, we propose supplementing the IPD process with an additional stationary process, namely a glow discharge ignited between the consecutive plasma impulses. In this combined impulse-stationary IPD, the basic transport of mass and energy takes place during the impulse process, whereas the glow discharge process permits the phase (chemical) composition of the growing layer to be controlled. Experiments with TiN as the model material have confirmed the advantages of this combined process. The lattice parameter of TiN produced by the combined technique at various process parameters ranged from 0.422 to 0.425 nm. For comparison, the TiN coatings obtained by the typical IPD method have a lattice constant ranging from 0.421 to 0.423 nm. The useful properties of the coatings produced by the combined technique are now being investigated. (C) 1998 Elsevier Science S.A.