Application of Mie theory and fractal models to determine the optical and surface roughness of Ag-Cu thin films

被引：44

作者：

Talu, Stefan ^{[1
]}

Yadav, Ram Pratap ^{[2
]}

Mittal, Ashok Kumar ^{[3
]}

Achour, Amine ^{[4
]}

Luna, Carlos ^{[5
]}

Mardani, Mohsen ^{[6
]}

Solaymani, Shahram ^{[7
]}

Arman, Ali ^{[6
]}

Hafezi, Fatemeh ^{[6
]}

Ahmadpourian, Azin ^{[8
]}

Naderi, Sirvan ^{[9
]}

Saghi, Khalil ^{[6
]}

Mendez, Alia ^{[10
]}

Trejo, Gabriel ^{[11
]}

机构：

[1] Tech Univ Cluj Napoca, Dept AET, Discipline Descript Geometry & Engn Graph, Fac Mech Engn, 103-105 B Dul Muncii St, Cluj Napoca 400641, Romania

[2] Motilal Nehru Natl Inst Technol, Dept Phys, Allahabad 211004, Uttar Pradesh, India

[3] Univ Allahabad, Dept Phys, Allahabad 211002, Uttar Pradesh, India

[4] INRS, 1650 Blvd Lionel Boulet, Varennes, PQ J3X 1P7, Canada

[5] Univ Autonoma Nuevo Leon, Fac Ciencias Fis Matemat, Av Univ S-N, San Nicolas De Los Garza 66455, Nuevo Leon, Mexico

[6] ACECR, Sharif Branch, Vacuum Technol Grp, Tehran, Iran

[7] Islamic Azad Univ, Sci & Res Branch, Dept Phys, Tehran, Iran

[8] Islamic Azad Univ, Arak Branch, Young Researchers & Elite Club, Arak, Iran

[9] Islamic Azad Univ, Kermanshah Branch, Young Researchers & Elite Club, Kermanshah, Iran

[10] Benemerita Univ Autonoma Puebla, Ctr Quim, ICUAP, Ciudad Univ Puebla, Puebla 72530, Mexico

[11] Ctr Res & Technol Dev Electrochem CIDETEQ, Parque Tecnol Sanfandila,AP 064, Pedro Escobedo 76703, Queretaro, Mexico

来源：

OPTICAL AND QUANTUM ELECTRONICS | 2017年 / 49卷 / 07期

关键词：

Ag-Cu thin films; AFM; Fractal analysis; Surface topography; DIFFERENT SUBSTRATE TEMPERATURES; PARTICLE COMPOSITE COATINGS; PHYSICAL-PROPERTIES; ROOM-TEMPERATURE; NI NANOPARTICLES; MAGNETORESISTANCE; MICROMORPHOLOGY; MICROSTRUCTURE; TIME;

D O I：

10.1007/s11082-017-1079-3

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Thin films of Ag/Cu were deposited by reactive DC magnetron sputtering on (001)-oriented Si and glass substrates for various deposition times (4-24 min). These films were characterized by atomic force microscopy (AFM), and a power law scaling was performed on the obtained micrographs to investigate the self-affine nature of the sample morphology, which is indicative of a fractal structure. We applied the Higuchi's algorithm to the AFM data to determine the fractal dimension of each sample, and the Hurst exponents were computed. The deposition time dependences of these parameters and the grain size distributions estimated from the UV-visible spectra using the Mie theory, allowed us to describe a particle formation mechanism during the deposition process, in which the length of continuous paths of conductive particles increases as the deposition time is increased. In agreement with this explanation, the electrical resistance decreased with the increment of the deposition time.

引用

页数：15

共 53 条

[1] Titanium vanadium nitride electrode for micro-supercapacitors [J].