Fabrication of a narrow gold wire using scanning tunneling microscopy

被引：1

作者：

Okamoto, H ^{[1
]}

Itakura, A ^{[1
]}

Yakabe, T ^{[1
]}

Nejoh, H ^{[1
]}

机构：

[1] Natl Res Inst Met, Tsukuba, Ibaraki 305, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1997年 / 36卷 / 6B期

关键词：

scanning tunneling microscopy; narrow gold wire; electro-migration; atomic device;

D O I：

10.1143/JJAP.36.3832

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new method for fabricating a narrow gold wire is presented. The resultant wire has width around 200 nm and length up to several microns. The wire is fabricated by using a tungsten tip to 'pull' gold atoms from a gold thin film towards a bare silicon region. This method is believed to be based bn the electro-migration effect. Moreover, the method can be used as a fabrication method for closely separated electrodes for future atomic devices because the whole process can be done in an ultra-high-vacuum (UHV) environment.

引用

页码：3832 / 3833

页数：2