Measuring the Refractive Index of Highly Crystalline Monolayer MoS2 with High Confidence

被引:134
作者
Zhang, Hui [1 ,2 ,3 ]
Ma, Yaoguang [1 ,2 ]
Wan, Yi [1 ,2 ]
Rong, Xin [1 ,2 ]
Xie, Ziang [1 ,2 ]
Wang, Wei [1 ,2 ]
Dai, Lun [1 ,2 ,3 ]
机构
[1] Peking Univ, State Key Lab Mesoscop Phys, Beijing 100871, Peoples R China
[2] Peking Univ, Sch Phys, Beijing 100871, Peoples R China
[3] Collaborat Innovat Ctr Quantum Matter, Beijing 100871, Peoples R China
来源
SCIENTIFIC REPORTS | 2015年 / 5卷
基金
中国国家自然科学基金;
关键词
VALLEY POLARIZATION; ATOMIC LAYERS; PHOTOLUMINESCENCE;
D O I
10.1038/srep08440
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Monolayer molybdenum disulphide (MoS2) has attracted much attention, due to its attractive properties, such as two-dimensional properties, direct bandgap, valley-selective circular dichroism, and valley Hall effect. However, some of its fundamental physical parameters, e. g. refractive index, have not been studied in detail because of measurement difficulties. In this work, we have synthesized highly crystalline monolayer MoS2 on SiO2/Si substrates via chemical vapor deposition (CVD) method and devised a method to measure their optical contrast spectra. Using these contrast spectra, we extracted the complex refractive index spectrum of monolayer MoS2 in the wavelength range of 400 nm to 750 nm. We have analyzed the pronounced difference between the obtained complex refractive index spectrum and that of bulk MoS2. The method presented here is effective for two-dimensional materials of small size. Furthermore, we have calculated the color contour plots of the contrast as a function of both SiO2 thickness and incident light wavelength for monolayer MoS2 using the obtained refractive index spectrum. These plots are useful for both fundamental study and device application.
引用
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页数:7
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