Effect of annealing on the composition, structure and mechanical properties of carbon nitride films deposited by middle-frequency magnetron sputtering

被引：10
作者：
Huang, Z. H.
Yang, B.
Liu, C. S.
Guo, L. P.
Fan, X. J.
Fu, D. J. [1 ]
机构：
[1] Wuhan Univ, Sch Phys, Accelerator Lab, Wuhan 430072, Peoples R China
[2] Wuhan Univ, Sch Power & Mech Engn, Wuhan 430072, Peoples R China
来源：
MATERIALS LETTERS | 2007年 / 61卷 / 16期
基金：
中国国家自然科学基金;
关键词：
carbon nitride; thermal properties; nanocrystal; microstructure; hardness;
D O I：
10.1016/j.matlet.2006.11.127
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Carbon nitride films were deposited by middle-frequency reactive magnetron sputtering and annealed at different temperatures in nitrogen ambient. X-ray photoelectron spectroscopy, Raman scattering, transmission electron microscopy, and nano-indenter were used to characterize the as-deposited and annealed films. The analysis showed that annealing resulted in the dissociation of N and C in the films. The dissociation of C happened after 500 degrees C and lagged behind that of N. With the increase of annealing temperature, the disorder of sp(2) C decreased and the films were gradually graphitized. The microstructure changed from amorphous to fullerene-like CNx with the annealing temperature increasing to 500 degrees C, and then to nitridized graphite nanocrystals at 600 degrees C. The graphitization resulted in a drastic decreasing of hardness and modulus of the films. (C) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码：3443 / 3445
页数：3
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