Direct write of optical diffractive elements and planar waveguides with a digital micromirror device based UV photoplotter

被引：20

作者：

Kessels, M. V. ^{[1
]}

Nassour, C. ^{[1
]}

Grosso, P. ^{[2
]}

Heggarty, K. ^{[1
]}

机构：

[1] Telecom Bretagne, F-29238 Brest 3, France

[2] ENSSAT, CCLO, CNRS, UMR Foton 6082, F-22305 Lannion, France

来源：

OPTICS COMMUNICATIONS | 2010年 / 283卷 / 15期

关键词：

Optical lithography; Mask less patterning; Photopolymers; Digital micromirror device; Computer generated hologram; Long period grating; LONG-PERIOD GRATINGS; FEMTOSECOND LASER; LITHOGRAPHY; POLYMER; ALGORITHM; FIBER;

D O I：

10.1016/j.optcom.2010.03.056

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A photoplotter, based on a digital micromirror device as real-time reconfigurable mask, is designed to direct-write microstructures in different photosensitive materials. Binary and multilevel elements, such as computer generated holograms with 2, 4 and 8 phase levels and planar optical waveguide structures with tapers and/or long period gratings, are fabricated in a single processing step. Direct parallel write into different photosensitive materials with attractive optical properties is proposed and first results are shown in a commercially available organic-inorganic hybrid material. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：3089 / 3094

页数：6

共 35 条

[31] New wafer-scale fabrication method for stacked optical waveguide interconnects and 3D micro-optic structures using photoresponsive (inorganic-organic hybrid) polymers [J].