Direct write of optical diffractive elements and planar waveguides with a digital micromirror device based UV photoplotter

被引：20
作者：
Kessels, M. V. [1 ]
Nassour, C. [1 ]
Grosso, P. [2 ]
Heggarty, K. [1 ]
机构：
[1] Telecom Bretagne, F-29238 Brest 3, France
[2] ENSSAT, CCLO, CNRS, UMR Foton 6082, F-22305 Lannion, France
来源：
OPTICS COMMUNICATIONS | 2010年 / 283卷 / 15期
关键词：
Optical lithography; Mask less patterning; Photopolymers; Digital micromirror device; Computer generated hologram; Long period grating; LONG-PERIOD GRATINGS; FEMTOSECOND LASER; LITHOGRAPHY; POLYMER; ALGORITHM; FIBER;
D O I：
10.1016/j.optcom.2010.03.056
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A photoplotter, based on a digital micromirror device as real-time reconfigurable mask, is designed to direct-write microstructures in different photosensitive materials. Binary and multilevel elements, such as computer generated holograms with 2, 4 and 8 phase levels and planar optical waveguide structures with tapers and/or long period gratings, are fabricated in a single processing step. Direct parallel write into different photosensitive materials with attractive optical properties is proposed and first results are shown in a commercially available organic-inorganic hybrid material. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码：3089 / 3094
页数：6
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