Structure and energetics of segregated and nonsegregated Ge(001)/Si(2x1)

被引:22
作者
Jenkins, SJ [1 ]
Srivastava, GP [1 ]
机构
[1] Univ Exeter, Dept Phys, Exeter EX4 4QL, Devon, England
关键词
D O I
10.1103/PhysRevB.57.8794
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present the results of ab initio pseudopotential density functional calculations for the geometry, energetics and electronic structure of the monolayer Si covered Ge(001)(2x1) surface. A segregated structure, in which Si occupies the second layer while Ge floats to the surface, is found to be energetically favorable by 0.38 eV per dimer compared to the nonsegregated Si-capped structure. In the latter case, the Si dimers are found to be asymmetric, with a bond length of 2.26 Angstrom and a tilt angle of 16.7 degrees, while in the segregated structure, the Ge dimers have a bond length of 2.39 Angstrom, and a tilt angle of 17.5 degrees. [S0163-1829(98)00712-7].
引用
收藏
页码:8794 / 8796
页数:3
相关论文
共 24 条
[1]   Ge segregation tested by X-ray photoelectron diffraction and surface atom titration during the first stage of Si heteroepitaxy on Ge(001)2 x 1 [J].
Aubel, D ;
Kubler, L ;
Bischoff, JL ;
Bolmont, D .
SURFACE SCIENCE, 1996, 352 :634-640
[2]   X-ray photoelectron diffraction investigation of Ce segregation and film morphology during first stage heteroepitaxy of Si on Ge(001) [J].
Aubel, D ;
Kubler, L ;
Bischoff, JL ;
Simon, L ;
Bolmont, D .
APPLIED SURFACE SCIENCE, 1996, 99 (02) :169-183
[3]   PSEUDOPOTENTIALS THAT WORK - FROM H TO PU [J].
BACHELET, GB ;
HAMANN, DR ;
SCHLUTER, M .
PHYSICAL REVIEW B, 1982, 26 (08) :4199-4228
[4]   GROUND-STATE OF THE ELECTRON-GAS BY A STOCHASTIC METHOD [J].
CEPERLEY, DM ;
ALDER, BJ .
PHYSICAL REVIEW LETTERS, 1980, 45 (07) :566-569
[5]   SURFACTANTS IN EPITAXIAL-GROWTH [J].
COPEL, M ;
REUTER, MC ;
KAXIRAS, E ;
TROMP, RM .
PHYSICAL REVIEW LETTERS, 1989, 63 (06) :632-635
[6]   DIFFUSION OF SI INTO GE STUDIED BY CORE LEVEL PHOTOEMISSION [J].
HOEVEN, AJ ;
AARTS, J ;
LARSEN, PK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (01) :5-8
[7]   INHOMOGENEOUS ELECTRON-GAS [J].
RAJAGOPAL, AK ;
CALLAWAY, J .
PHYSICAL REVIEW B, 1973, 7 (05) :1912-1919
[8]   SURFACTANT-MEDIATED GROWTH OF GE ON SI(111) [J].
HORNVONHOEGEN, M ;
COPEL, M ;
TSANG, JC ;
REUTER, MC ;
TROMP, RM .
PHYSICAL REVIEW B, 1994, 50 (15) :10811-10822
[9]   STRAIN RELIEF BY MICROROUGHNESS IN SURFACTANT-MEDIATED GROWTH OF GE ON SI(001) [J].
HORNVONHOEGEN, M ;
MULLER, BH ;
ALFALOU, A .
PHYSICAL REVIEW B, 1994, 50 (16) :11640-11652
[10]   Theoretical evidence concerning mixed dimer growth on the Si(001)(2x1)-Ge surface [J].
Jenkins, SJ ;
Srivastava, GP .
JOURNAL OF PHYSICS-CONDENSED MATTER, 1996, 8 (36) :6641-6651