Copolymerization of cyclopropyl-substituted dioxolanylmethyl acrylates with styrene and synthesis of photosensitive copolymers

被引：1

作者：

Ramazanov, G. A. ^{[1
]}

Shakhnazarli, R. Z. ^{[2
]}

Guliev, A. M. ^{[2
]}

机构：

[1] Sumgait State Univ, Sumgait, Azerbaijan

[2] Natl Acad Sci Azerbaijan, Inst Polymer Mat, Sumgait, Azerbaijan

来源：

RUSSIAN JOURNAL OF APPLIED CHEMISTRY | 2010年 / 83卷 / 03期

关键词：

CINNAMATE;

D O I：

10.1134/S1070427210030201

中图分类号：

O69 [应用化学];

学科分类号：

081704 ;

摘要：

Radical copolymerization of new monomers, cyclopropyl-substituted dioxolanylmethyl acrylates, with styrene in benzene solution was studied at low conversions. The copolymer compositions and the relative activity constants and Alfrey-Price constants of cyclopropane-containing dioxolanylmethyl acrylates were determined. The sensitivity of the copolymers obtained to UV radiation was studied, and the possibility of using them as photoresists was revealed.

引用

页码：482 / 486

页数：5

共 12 条

[1]

Ali AH, 1997, POLYM INT, V43, P310

[2]

BERNER BJ, 1997, POLYM CHEM, V35, P3571

[3]

BIGLOVA RZ, 2006, PLAST MASSY, P19

[4] NEW ACRYLATES AND METHACRYLATES BEARING PENDANT SPIRO ORTHO ESTER GROUPS [J].