Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm

被引:19
作者
Liu, Guanghui [1 ]
Zhou, Ming [1 ]
Hu, Guohang [1 ]
Liu, Xiaofeng [1 ]
Jin, Yunxia [1 ]
He, Hongbo [1 ]
Fan, Zhengxiu [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Lasers, Shanghai 201800, Peoples R China
关键词
LaF3/MgF2 high reflectors; Temperature fields; Film-substrate interface; LIDT; Layer-pair number; Damage depth; Damage mechanism; MULTILAYER COATINGS; OPTICAL-PROPERTIES; THIN-FILMS; ABSORPTION; 193NM;
D O I
10.1016/j.apsusc.2010.02.003
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Laser induced damage thresholds (LIDT) of LaF3/MgF2 high reflectors at 355 nm were measured and investigated as a function of layer-pair number. Generally, LaF3/MgF2 coatings with more layer pairs possessed higher LIDT, but coatings with too high layer-pair number crazed because of high tensile stress, so the LIDT of them decreased badly. The temperature rise in the coatings was calculated based on a film-substrate interfacial absorption model, and the depth of the damage in the coatings were measured by a Veeco optical profilograph. The two characterization methods together were used to interpret the effects of layer-pair number on LIDT, and the damage mechanism of coatings at laser wavelength of 355 nm was also discussed. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:4206 / 4210
页数:5
相关论文
共 15 条
  • [2] Laser resistivity and damage causes in coating materials for 193nm by photothermal methods
    Blaschke, H
    Thielsch, R
    Heber, J
    Kaiser, N
    Martin, S
    Welsch, E
    [J]. LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1998, 1999, 3578 : 74 - 82
  • [3] Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique
    Blaschke, H
    Arens, W
    Ristau, D
    Martin, S
    Li, BC
    Welsch, E
    [J]. LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1999, 2000, 3902 : 242 - 249
  • [4] Mechanical stress in 355 nm LaF3/MgF2 high reflectors with various layer-pair number and methods for reduction
    Liu, Guang-hui
    Xiao, Qi-ling
    Jin, Yun-xia
    Zhang, Wei-li
    He, Hong-bo
    Fan, Zheng-xiu
    [J]. VACUUM, 2010, 84 (06) : 778 - 781
  • [5] Effect of substrate temperatures on the optical properties of evaporated Sc2O3 thin films
    Liu, Guanghui
    Jin, Yunxia
    He, Hongbo
    Fan, Zhengxiu
    [J]. THIN SOLID FILMS, 2010, 518 (10) : 2920 - 2923
  • [6] LASER-INDUCED LOCAL HEATING OF MULTILAYERS
    MANSURIPUR, M
    CONNELL, GAN
    GOODMAN, JW
    [J]. APPLIED OPTICS, 1982, 21 (06): : 1106 - 1114
  • [7] Effects of layer thickness and number of interfaces on the damage threshold of ultra violet sol gel mirrors
    McIinnes, HA
    Andrew, JE
    Bazin, NJ
    Morris, AJ
    Porter, KJ
    [J]. LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1998, 1999, 3578 : 128 - 136
  • [8] SIMPLE METHOD FOR CALCULATING OPTICAL-PROPERTIES OF MULTILAYER-DIELECTRIC REFLECTORS
    SPARKS, M
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1977, 67 (11) : 1590 - 1594
  • [9] INFLUENCE OF DEPOSITION PARAMETERS ON LASER DAMAGE THRESHOLD OF 355-NM SCANDIUM OXIDE-MAGNESIUM FLUORIDE HIGH-REFLECTOR COATINGS
    TAMURA, S
    KIMURA, S
    SATO, Y
    MOTOKOSHI, S
    YOSHIDA, H
    YOSHIDA, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (10): : 1960 - 1962
  • [10] MEASUREMENT OF THIN-FILM OPTICAL-ABSORPTION AT THE AIR-FILM INTERFACE WITHIN THE FILM AND AT THE FILM-SUBSTRATE INTERFACE
    TEMPLE, PA
    [J]. APPLIED PHYSICS LETTERS, 1979, 34 (10) : 677 - 679