Effect of deposition pressure on mechanical properties of Al-Mg-B thin films

被引：1
作者：
Kang, R. F. [1 ,2 ]
Bai, Y. Z. [1 ,2 ]
Qin, F. W. [1 ,2 ]
Zhao, Y. [1 ,2 ]
Pang, J. Q. [1 ,2 ]
Zhao, J. [1 ,2 ]
机构：
[1] Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China
[2] Dalian Univ Technol, Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Dalian 116024, Peoples R China
来源：
SURFACE ENGINEERING | 2014年 / 30卷 / 12期
关键词：
Thickness; Roughness; Amorphous; Hardness; MICROSTRUCTURE; ALMGB14; BORIDES;
D O I：
10.1179/1743294413Y.0000000220
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
This work explored the effect of deposition pressure on the properties of the ternary Al-Mg-B thin films deposited on Si substrate at high deposition temperature (600 degrees C) by magnetron sputtering system with one pure boron target and one Al/Mg co-target. The influences of the deposition pressure on the elemental contents, deposition rate, surface roughness, structure and mechanical properties were investigated by Electron microprobe analysis (EPMA), 3D surface profiler, X-ray diffraction (XRD), Fourier transforms infrared spectroscopy (FTIR), and nanoindentation experiments respectively. Experimental results indicated that the amorphous thin films deposited at 0.5 Pa had a smooth surface and displayed the maximum hardness and Young's modulus of 35 and 322 GPa respectively. From the results of this work, high quality Al-Mg-B hard thin films can be obtained by magnetron sputtering under an optimum deposition pressure of 0.5 Pa.
引用
收藏
页码：900 / 904
页数：5
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