Scanning nanolithography using a material-filled nanopipette

被引：63
作者：
Hong, MH
Kim, KH
Bae, J
Jhe, W [1 ]
机构：
[1] Seoul Natl Univ, Ctr Near Field Atom Photon Technol, Seoul 151742, South Korea
[2] Seoul Natl Univ, Dept Phys, Seoul 151742, South Korea
来源：
APPLIED PHYSICS LETTERS | 2000年 / 77卷 / 16期
关键词：
D O I：
10.1063/1.1319181
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A scanning nanolithography is demonstrated by employing near-field optical microscopy with a pulled micropipette which is used for material transport as well as distance regulation. Delivering the photoresist through the small aperture (300 nm diameter) of the pulled pipette with the shear-force distance control, we have fabricated nanometric dots (300 nm diameter) on the gold-sputtered substrate. This scheme may be also useful in nanometric control of chemical reaction and repair of nanometric structures. (C) 2000 American Institute of Physics. [S0003-6951(00)04542-3].
引用
收藏
页码：2604 / 2606
页数：3
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