Convenient Preparation of High-Quality Specimens for Annealing Experiments in the Transmission Electron Microscope

被引:40
作者
Duchamp, Martial [1 ,1 ]
Xu, Qiang [2 ,3 ]
Dunin-Borkowski, Rafal E. [1 ]
机构
[1] Forschungszentrum Julich, Peter Grunberg Inst, D-52428 Julich, Germany
[2] DENSsolutions, NL-2628 XH Delft, Netherlands
[3] Delft Univ Technol, Kavli Inst Nanosci, NL-2628 CJ Delft, Netherlands
关键词
transmission electron microscopy; specimen preparation; focused ion beam milling; in situ annealing;
D O I
10.1017/S1431927614013476
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A procedure based on focused ion beam milling and in situ lift-out is introduced for the preparation of high-quality specimens for in situ annealing experiments in the transmission electron microscope. The procedure allows an electron-transparent lamella to be cleaned directly on a heating chip using a low ion energy and back-side milling in order to minimize redeposition and damage. The approach is illustrated through the preparation of an Al-Mn-Fe complex metallic alloy specimen.
引用
收藏
页码:1638 / 1645
页数:8
相关论文
共 25 条
[11]   In situ redox cycle of a nickel-YSZ fuel cell anode in an environmental transmission electron microscope [J].
Jeangros, Q. ;
Faes, A. ;
Wagner, J. B. ;
Hansen, T. W. ;
Aschauer, U. ;
Van herle, J. ;
Hessler-Wyser, A. ;
Dunin-Borkowski, R. E. .
ACTA MATERIALIA, 2010, 58 (14) :4578-4589
[12]  
Kempshall B. W., 2002, INT C ELECT MICROSC, V1, P249
[13]   Preparation of transmission electron microscopy cross-section specimens using focused ion beam milling [J].
Langford, RM ;
Petford-Long, AK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2001, 19 (05) :2186-2193
[14]   Preparation of site specific transmission electron microscopy plan-view specimens using a focused ion beam system [J].
Langford, RM ;
Huang, YZ ;
Lozano-Perez, S ;
Titchmarsh, JM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (03) :755-758
[15]  
Legros M., 2001, MAT SCI ENG A-STRUCT, V463, P309
[16]   ABNORMAL GRAIN-GROWTH IN ALUMINUM-ALLOY THIN-FILMS [J].
LONGWORTH, HP ;
THOMPSON, CV .
JOURNAL OF APPLIED PHYSICS, 1991, 69 (07) :3929-3940
[17]  
Radulescu F, 2001, MATER RES SOC SYMP P, V589, P179
[18]   Atomic scale observation and characterization of redox-induced interfacial layers in commercial Si thin film photovoltaics [J].
Ramasse, Quentin ;
Anapolsky, Abraham ;
Lazik, Christopher ;
Jin, Miao ;
Armstrong, Karl ;
Wang, Dapeng .
JOURNAL OF APPLIED PHYSICS, 2009, 105 (03)
[19]   Focused ion beam preparation and EFTEM/EELS studies on vanadium nitride thin films [J].
Rogers, M ;
Kothleitner, G ;
Berendes, A ;
Bock, W ;
Kolbesen, BO .
PRAKTISCHE METALLOGRAPHIE-PRACTICAL METALLOGRAPHY, 2005, 42 (04) :172-187
[20]   Sample preparation for atomic-resolution STEM at low voltages by FIB [J].
Schaffer, Miroslava ;
Schaffer, Bernhard ;
Ramasse, Quentin .
ULTRAMICROSCOPY, 2012, 114 :62-71