High refractive index and high transparency HfO2 nanocomposites for next generation lithography

被引：61

作者：

Bae, Woo Jin ^{[1
]}

Trikeriotis, Markos ^{[1
]}

Sha, Jing ^{[1
]}

Schwartz, Evan L. ^{[1
]}

Rodriguez, Robert ^{[1
]}

Zimmerman, Paul ^{[2
]}

Giannelis, Emmanuel P. ^{[1
]}

Ober, Christopher K. ^{[1
]}

机构：

[1] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA

[2] SEMATECH, Albany, NY 12203 USA

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2010年 / 20卷 / 25期

关键词：

IMMERSION LITHOGRAPHY; FLUIDS; OXIDE;

D O I：

10.1039/c0jm00679c

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

HfO2 nanoparticles stabilized with selected ligands possess high refractive index and low absorbance under 193 nm radiation. These materials combined with an appropriate photopolymer were used as a nanocomposite photoresist. The resulting nanocomposite materials were used successfully for high resolution patterning.

引用

页码：5186 / 5189

页数：4

共 26 条

[1] Nanocomposite materials for optical applications [J].

Beecroft, LL ;

Ober, CK .

CHEMISTRY OF MATERIALS, 1997, 9 (06) :1302-1317

[2] High Refractive Index Nanocomposite Fluids for Immersion Lithography [J].

Bremer, L. ;

Tuinier, R. ;

Jahromi, S. .

LANGMUIR, 2009, 25 (04) :2390-2401

[3] Resistive switching effects of HfO2 high-k dielectric [J].

Chan, M. Y. ;

Zhang, T. ;

Ho, V. ;

Lee, P. S. .

MICROELECTRONIC ENGINEERING, 2008, 85 (12) :2420-2424

[4] Nanocomposite liquids for 193 nm immersion lithography: A progress report [J].

Chumanov, G ;

Evanoff, DD ;

Luzinov, I ;

Klep, V ;

Zdyrko, B ;

Conley, W ;

Zimmerman, P .

Advances in Resist Technology and Processing XXII, Pt 1 and 2, 2005, 5753 :847-850

[5] Is ArF the final wavelength? [J].

Conley, W ;

Bendik, J .

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXI, PTS 1 AND 2, 2004, 5376 :16-20

[6] One-pot synthesis of robust core/shell gold nanoparticles [J].

Dong, Hongchen ;

Zhu, Manzhou ;

Yoon, Jeong Ae ;

Gao, Haifeng ;

Jin, Rongchao ;

Matyjaszewski, Krzysztof .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2008, 130 (39) :12852-+

[7]

Gomez-Romero P, 2001, ADV MATER, V13, P163, DOI 10.1002/1521-4095(200102)13:3<163::AID-ADMA163>3.3.CO

[8]

2-L

[9] Amplification of the index of refraction of aqueous immersion fluids by ionic surfactants [J].

Lee, K ;

Kunjappu, J ;

Jockusch, S ;

Turro, NJ ;

Widerschpan, T ;

Zhou, JM ;

Smith, BW ;

Zimmerman, P ;

Conley, W .

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXII, PT 1 AND 2, 2005, 5753 :537-553

[10] Polycycloalkanes as potential third-generation immersion fluids for photolithography at 193 nm [J].

Lopez-Gejo, Juan ;

Kunjappu, Joy T. ;

Zhou, J. ;

Smith, B. W. ;

Zimmerman, Paul ;

Conley, Will ;

Turro, Nicholas J. .

CHEMISTRY OF MATERIALS, 2007, 19 (15) :3641-3647

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