Liquid crystal display surface uniformity defect inspection using analysis of variance and exponentially weighted moving average techniques

被引:75
作者
Jiang, BC [1 ]
Wang, CC
Liu, HC
机构
[1] Yuan Ze Univ, Dept Ind Engn & Management, Chungli 320, Taiwan
[2] Ming Chi Univ Technol, Grad Sch Engn Management, Taipei 243, Taiwan
关键词
liquid crystal display (LCD); defects inspection; analysis of variance (ANOVA); exponentially weighted moving average (EWMA);
D O I
10.1080/00207540412331285832
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Display quality is part of the final liquid crystal display (LCD) inspection process before shipping. A 'limited sample' is provided based on the agreement between the manufacturer and the customer. This inspection usually includes an operator who compares the LCD product with the limit sample using the naked eye. The procedure often causes controversy in the manufacturing plant and between the manufacturer and customers. This study attempts to establish a more objective, automatic method to determine the MURA-type defects in LCD panels. A luminance meter is used as the measurement device. An LCD panel is divided into 144 areas. Five points are measured to obtain the luminances. Analysis of variance and the exponentially weighted moving average techniques are applied to determine the existence of MURA defects. Fifty normal LCD panels and 50 MURA defects panels were used to test the inspection method. All 50 LCD panels with MURA defects were correctly identified using the proposed inspection method. The proposed inspection method can help LCD manufacturers reduce the variation in LCD panel inspection results and establish a better relationship with customers through a common inspection mechanism.
引用
收藏
页码:67 / 80
页数:14
相关论文
共 15 条
[1]  
BOC GE, 1987, STAT EXPT
[2]  
HWANG CS, 2001, 12 NAT AUT TECHN C 4, V2
[3]   Machine vision-based gray relational theory applied to IC marking inspection [J].
Jiang, BC ;
Tasi, SL ;
Wang, CC .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2002, 15 (04) :531-539
[4]  
Jiang BC, 2001, INT J PROD RES, V39, P2215, DOI 10.1080/00207540110044015
[5]  
Kim JH, 2001, ISIE 2001: IEEE INTERNATIONAL SYMPOSIUM ON INDUSTRIAL ELECTRONICS PROCEEDINGS, VOLS I-III, P101, DOI 10.1109/ISIE.2001.931763
[6]  
Lin CS, 1998, OPTIK, V109, P133
[7]  
LU CJ, 2002, P 4 AS PAC C IND ENG
[8]  
LUCAS JM, 1990, TECHNOMETRICS, V32, P1, DOI 10.2307/1269835
[9]  
Montgomery D. C., 2009, Introduction to statistical quality control
[10]  
Montgomery D. C., 2003, APPL STAT PROBABILIT