Laser-induced retinal damage threshold for repetitive-pulse exposure to 100-μs pulses

被引:8
作者
Lund, Brian J. [1 ]
Lund, David J. [1 ]
Edsall, Peter R. [1 ]
Gaines, Victor D. [1 ]
机构
[1] US Army Inst Surg Res, Jbsa Ft Sam Houston, TX 78234 USA
关键词
laser; laser safety; retina; damage threshold; maximum permissible exposure; repetitive pulse; microcavitation; thermal damage; PIGMENT-EPITHELIUM; TIME REGIMEN; INJURY; CELLS;
D O I
10.1117/1.JBO.19.10.105006
中图分类号
Q5 [生物化学];
学科分类号
071010 ; 081704 ;
摘要
The laser-induced retinal injury thresholds for repetitive-pulse exposures to 100-mu s-duration pulses at a wavelength of 532 nm have been determined for exposures of up to 1000 pulses in an in vivo model. The ED50 was measured for pulse repetition frequencies of 50 and 1000 Hz. Exposures to collimated beams producing a minimal retinal beam spot and to divergent beams producing a 100-mu m-diameter retinal beam spot were considered. The ED50 for a 100-mu s exposure was measured to be 12.8 mu J total intraocular energy for a minimal retinal beam spot exposure and 18.1 mu J total intraocular energy for a 100-mu m-diameter retinal beam spot. The threshold for exposures to N > 1 pulse was found to be the same for both pulse repetition frequencies. The variation of the ED50 with the number of pulses is described well by the probability summation model, in which each pulse is considered an independent event. This is consistent with a threshold-level damage mechanism of microcavitation for single-pulse 100-mu s-duration exposures. The data support the maximum permissible exposure levels for repetitive-pulse exposure promulgated in the most recent laser safety guidelines. (C) The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License.
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页数:7
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