Boriding titanium alloys at lower temperatures using electrochemical methods

被引：35

作者：

Celikkan, Huseyin ^{[1
]}

Ozturk, M. Kemal

Aydin, Hasan

Aksu, Mehmet Levent

机构：

[1] Turkish Min Res & Explorat Inst, TR-06520 Ankara, Turkey

[2] Gazi Univ, Fac Sci, Dept Phys, TR-06500 Ankara, Turkey

[3] Gazi Univ, Fac Sci, Dept Chem, TR-06500 Ankara, Turkey

[4] Gazi Univ, Fac Sci, Dept Chem Educ, TR-06500 Ankara, Turkey

来源：

THIN SOLID FILMS | 2007年 / 515卷 / 13期

关键词：

boriding; electrochemistry; titanium alloys; tempering;

D O I：

10.1016/j.tsf.2007.01.020

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this study the boriding of titanium alloys was attempted with the use of electrochemical methods at room temperature followed by a tempering process at much lower temperatures than those reported in literature. The electrochemical boriding process with tempering at 500 degrees C resulted in the formation of compact TiB and TiB2 layers. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：5348 / 5352

页数：5

共 13 条

[1]

BAUDIS U, 1985, ULLMANNS ENCY IND A, V4, P281

[2] Effect of boron paste thickness on the growth kinetics of Fe2B boride layers during the boriding process [J].

Campos, I ;

Bautista, O ;

Ramírez, G ;

Islas, M ;

De La Parra, J ;

Zúñiga, L .

APPLIED SURFACE SCIENCE, 2005, 243 (1-4) :429-436

[3] A study of the potentials achieved during mechanical abrasion and the repassivation rate of titanium and Ti6Al4V in inorganic buffer solutions and bovine serum [J].

Contu, F ;

Elsener, B ;

Böhni, H .

ELECTROCHIMICA ACTA, 2004, 50 (01) :33-41

[4] Chemical and electrochemical behavior of titanium diboride in cryolite-alumina melt and in molten aluminum [J].

Devyatkin, SV ;

Kaptay, G .

JOURNAL OF SOLID STATE CHEMISTRY, 2000, 154 (01) :107-109

[5]

Hofsäss H, 2004, DIAM RELAT MATER, V13, P1103, DOI [10.1016/j.diamond.2004.01.021, 10.1016/j.diamond.2003.01.021]

[6] Influence of the pack thickness of the boronizing mixture on the boriding of steel [J].

Jain, V ;

Sundararajan, G .

SURFACE & COATINGS TECHNOLOGY, 2002, 149 (01) :21-26

[7] Preparation and properties of boron thin films [J].

Kamimura, K ;

Nagaoka, T ;

Shinomiya, T ;

Nakao, M ;

Onuma, Y ;

Makimura, M .

THIN SOLID FILMS, 1999, 343 :342-344

[8]

Kaptay G., 1999, Plasmas Ions, V2, P45, DOI DOI 10.1016/S1288-3255(00)87686-8

[9] ELECTROCHEMICAL AND THERMOCHEMICAL BORIDING IN MOLTEN-SALTS [J].

MATIASOVSKY, K ;

CHRENKOVAPAUCIROVA, M ;

FELLNER, P ;

MAKYTA, M .

SURFACE & COATINGS TECHNOLOGY, 1988, 35 (1-2) :133-149

[10] MECHANICAL-PROPERTIES OF BORON FILMS [J].

MATUDA, N ;

BABA, S ;

KINBARA, A .

THIN SOLID FILMS, 1982, 89 (02) :139-142

← 1 2 →