Removal of Ar+ beam-induced damaged layers from polyimide surfaces with argon gas cluster ion beams

被引：92
作者：
Miyayama, Takuya [1 ]
Sanada, Noriaki [1 ]
Bryan, Scott R. [2 ]
Hammond, John S. [2 ]
Suzuki, Mineharu [1 ]
机构：
[1] ULVAC PHI Inc, Kanagawa 2538522, Japan
[2] Phys Elect Inc, Chanhassen, MN 55317 USA
来源：
SURFACE AND INTERFACE ANALYSIS | 2010年 / 42卷 / 09期
关键词：
polyimide; XPS; sputter depth profile; gas cluster ion beam; RAY PHOTOELECTRON-SPECTROSCOPY; MASS-SPECTROMETRY; FILMS; XPS; C-60(+);
D O I：
10.1002/sia.3675
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
An Ar Gas Cluster Ion Beam (GCIB) has been shown to remove previous Ar+ ion beam-induced surface damage to a bulk polyimide (PI) film. After removal of the damaged layer with a GCIB sputter source, XPS measurements show minor changes to the carbon, nitrogen and oxygen atomic concentrations relative to the original elemental bulk concentrations. The GCIB sputter depth profiles showed that there is a linear relationship between the Ar+ ion beam voltage within the range from 0.5 to 4.0 keV and the dose of argon cluster ions required to remove the damaged layer. The rate of recovery of the original PI atomic composition as a function of GCIB sputtering is similar for carbon, nitrogen and oxygen, indicating that there was no preferential sputtering for these elements. The XPS chemical state analysis of the N 1s spectra after GCIB sputtering revealed a 17% damage ratio of altered nitrogen chemical state species. Further optimization of the GCIB sputtering conditions should lead to lower nitrogen damage ratios with the elemental concentrations closer to those of bulk PI. Copyright (C) c 2010 John Wiley & Sons, Ltd.
引用
收藏
页码：1453 / 1457
页数：5
相关论文
共 28 条
[1]   Molecular depth profiling with cluster ion beams [J].
Cheng, J ;
Wucher, A ;
Winograd, N .
JOURNAL OF PHYSICAL CHEMISTRY B, 2006, 110 (16) :8329-8336
[2]   XPS study of ion beam modified polyimide films [J].
Ektessabi, AM ;
Hakamata, S .
THIN SOLID FILMS, 2000, 377 :621-625
[3]   C60 sputtering of organics: A study using TOF-SIMS, XPS and nanoindentation [J].
Fisher, Gregory L. ;
Dickinson, Michelle ;
Bryan, Scott R. ;
Moulder, John .
APPLIED SURFACE SCIENCE, 2008, 255 (04) :819-823
[4]   Secondary ion mass spectrometry using cluster primary ion beams [J].
Gillen, G ;
Fahey, A .
APPLIED SURFACE SCIENCE, 2003, 203 :209-213
[5]   Incident Angle Dependence in Polymer TOF-SIMS Depth Profiling with C-60 Ion Beams [J].
Iida, Shin-ichi ;
Miyayama, Takuya ;
Sanada, Noriaki ;
Suzuki, Mineharu ;
Fisher, Gregory L. ;
Bryan, Scott R. .
E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY, 2009, 7 :878-881
[6]   Energy deposition during molecular depth profiling experiments with cluster ion beams [J].
Kozole, Joseph ;
Wucher, Andreas ;
Winograd, Nicholas .
ANALYTICAL CHEMISTRY, 2008, 80 (14) :5293-5301
[7]   Ion-beam-produced structural defects in ZnO [J].
Kucheyev, SO ;
Williams, JS ;
Jagadish, C ;
Zou, J ;
Evans, C ;
Nelson, AJ ;
Hamza, AV .
PHYSICAL REVIEW B, 2003, 67 (09)
[8]   Effect of ion species on the accumulation of ion-beam damage in GaN [J].
Kucheyev, SO ;
Williams, JS ;
Jagadish, C ;
Zou, J ;
Li, G ;
Titov, AI .
PHYSICAL REVIEW B, 2001, 64 (03)
[9]   Organic Depth Profiling of a Nanostructured Delta Layer Reference Material Using Large Argon Cluster Ions [J].
Lee, J. L. S. ;
Ninomiya, S. ;
Matsuo, J. ;
Gilmore, I. S. ;
Seah, M. P. ;
Shard, A. G. .
ANALYTICAL CHEMISTRY, 2010, 82 (01) :98-105
[10]   Temperature-controlled depth profiling of poly(methyl methacrylate) using cluster secondary ion mass spectrometry. 1. Investigation of depth profile characteristics [J].
Mahoney, Christine M. ;
Fahey, Albert J. ;
Gillen, Greg .
ANALYTICAL CHEMISTRY, 2007, 79 (03) :828-836
123