Additive Manufacturing of Metal Structures at the Micrometer Scale

被引:335
作者
Hirt, Luca [1 ,2 ]
Reiser, Alain [3 ]
Spolenak, Ralph [3 ]
Zambelli, Tomaso [1 ,2 ]
机构
[1] ETH, Gloriastr 35, CH-8092 Zurich, Switzerland
[2] Univ Zurich, Inst Biomed Engn, Lab Biosensors & Bioelect, Gloriastr 35, CH-8092 Zurich, Switzerland
[3] ETH, Dept Mat, Lab Nanomet, Vladimir Prelog Weg 5, CH-8093 Zurich, Switzerland
关键词
FOCUSED-ELECTRON-BEAM; LOCALIZED ELECTROCHEMICAL DEPOSITION; CHEMICAL-VAPOR-DEPOSITION; SCANNING TUNNELING MICROSCOPE; HIGH-RESOLUTION; DIRECT-WRITE; 3-DIMENSIONAL MICROFABRICATION; NANOSTRUCTURE FABRICATION; DIGITAL MICROFABRICATION; DIFFUSION-COEFFICIENT;
D O I
10.1002/adma.201604211
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Currently, the focus of additive manufacturing (AM) is shifting from simple prototyping to actual production. One driving factor of this process is the ability of AM to build geometries that are not accessible by subtractive fabrication techniques. While these techniques often call for a geometry that is easiest to manufacture, AM enables the geometry required for best performance to be built by freeing the design process from restrictions imposed by traditional machining. At the micrometer scale, the design limitations of standard fabrication techniques are even more severe. Microscale AM thus holds great potential, as confirmed by the rapid success of commercial micro-stereolithography tools as an enabling technology for a broad range of scientific applications. For metals, however, there is still no established AM solution at small scales. To tackle the limited resolution of standard metal AM methods (a few tens of micrometers at best), various new techniques aimed at the micrometer scale and below are presently under development. Here, we review these recent efforts. Specifically, we feature the techniques of direct ink writing, electrohydrodynamic printing, laser-assisted electrophoretic deposition, laser-induced forward transfer, local electroplating methods, laser-induced photoreduction and focused electron or ion beam induced deposition. Although these methods have proven to facilitate the AM of metals with feature sizes in the range of 0.1-10 mu m, they are still in a prototype stage and their potential is not fully explored yet. For instance, comprehensive studies of material availability and material properties are often lacking, yet compulsory for actual applications. We address these items while critically discussing and comparing the potential of current microscale metal AM techniques.
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页数:30
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