Measured radial dependence of the peak sheath voltages present in very high frequency capacitive discharges

被引:17
作者
Barnat, E. V.
Miller, P. A.
Hebner, G. A.
Paterson, A. M.
Panagopoulos, Theodoros
Hammond, Edward
Holland, J.
机构
[1] Sandia Natl Labs, Albuquerque, NM 87185 USA
[2] Appl Mat Inc, Sunnyvale, CA 94086 USA
关键词
D O I
10.1063/1.2735934
中图分类号
O59 [应用物理学];
学科分类号
摘要
The radial distribution of the measured voltage drop across a sheath formed between a 300 mm electrode and an argon plasma discharge is shown to depend on the excitation radio frequency, under constant power and pressure conditions. At a lower frequency of 13.56 MHz, the voltage drop across the sheath is uniform across the 300 mm electrode, while at higher frequencies of 60 and 162 MHz the voltage drop becomes radially nonuniform. The magnitude and spatial extent of the nonuniformity become greater with increasing frequency. (C) 2007 American Institute of Physics.
引用
收藏
页数:3
相关论文
共 19 条
[11]   Standing wave and skin effects in large-area, high-frequency capacitive discharges [J].
Lieberman, MA ;
Booth, JP ;
Chabert, P ;
Rax, JM ;
Turner, MM .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (03) :283-293
[12]   Spatial and frequency dependence of plasma currents in a 300mm capacitively coupled plasma reactor [J].
Miller, Paul A. ;
Barnat, Edward V. ;
Hebner, Gregory A. ;
Paterson, Alex M. ;
Holland, John P. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2006, 15 (04) :889-899
[13]   Frequency effects in processing plasmas of the VHF band [J].
Oda, Shunri .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1993, 2 (01) :26-29
[14]   rf electrode sheath formation near a concave electrode [J].
Orlov, KE ;
Malik, DA ;
Chernoiziumskaya, TV ;
Smirnov, AS .
PHYSICAL REVIEW LETTERS, 2004, 92 (05) :3
[15]   A voltage uniformity study in large-area reactors for RF plasma deposition [J].
Sansonnens, L ;
Pletzer, A ;
Magni, D ;
Howling, AA ;
Hollenstein, C ;
Schmitt, JPM .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1997, 6 (02) :170-178
[16]   Experimental and numerical studies on voltage distribution in capacitively coupled very high-frequency plasmas [J].
Satake, K ;
Yamakoshi, H ;
Noda, M .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2004, 13 (03) :436-445
[17]   Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor [J].
Schmidt, H ;
Sansonnens, L ;
Howling, AA ;
Hollenstein, C ;
Elyaakoubi, M ;
Schmitt, JPM .
JOURNAL OF APPLIED PHYSICS, 2004, 95 (09) :4559-4564
[18]   Uniformity of radio frequency bias voltages along conducting surfaces in a plasma [J].
Stevens, JE ;
Sowa, MJ ;
Cecchi, JL .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (01) :139-143
[19]   CAPACITIVELY COUPLED GLOW-DISCHARGES AT FREQUENCIES ABOVE 13.56 MHZ [J].
SURENDRA, M ;
GRAVES, DB .
APPLIED PHYSICS LETTERS, 1991, 59 (17) :2091-2093