Studies on the oxidation behavior of niobium-implanted Zircaloy-4 at 500 °C

被引:9
作者
Chen, XW [1 ]
Bai, XD
Yu, RH
Zhou, QG
Chen, BS
机构
[1] Tsinghua Univ, Dept Mat Sci & Engn, Beijing 100084, Peoples R China
[2] Jianzhong Chem Cooperat, Yibin 644000, Sichuan, Peoples R China
关键词
D O I
10.1016/S0022-3115(02)01308-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effect of niobium ion implantation on the oxidation behavior of Zircaloy-4 was investigated. It was interesting to find that the oxidation behavior of Zircaloy-4 was deteriorated after niobium ion implantation. Auger electron spectroscopy, X-ray photoemission spectroscopy and glancing angle X-ray diffraction were employed to analyze the depth profile of the element composition, the valence of the oxide scale and the phase of the oxidation products, respectively. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:190 / 193
页数:4
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