Visible-light enhancement of methylene blue photodegradation by graphitic carbon nitride-titania composites

被引：34

作者：

Fu, Dongying ^{[1
]}

Han, Gaoyi ^{[1
]}

Liu, Feifei ^{[1
]}

Xiao, Yaoming ^{[1
]}

Wang, Hongfei ^{[1
]}

Liu, Ruiqin ^{[1
]}

Liu, Cuixian ^{[1
]}

机构：

[1] Shanxi Univ, Inst Mol Sci, Key Lab Chem Biol & Mol Engn, Minist Educ, Taiyuan 030006, Peoples R China

来源：

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING | 2014年 / 27卷

基金：

中国国家自然科学基金;

关键词：

g-C3N4; TiO2; Melamine; Photocatalytic degradation; Methylene blue; Visible light; ZNS QUANTUM DOTS; PHOTOCATALYTIC ACTIVITY; HYBRID; FILMS; TIO2; PERFORMANCE; G-C3N4; NANOPHOTOCATALYSTS; WATER; PURE;

D O I：

10.1016/j.mssp.2014.08.004

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Composites of graphite-like C3N4 (g-C3N4) and TiO2 were synthesized by direct heating of melamine in the presence of different TiO2 amounts in a semi-closed stainless steel container. The resulting samples were characterized using X-ray diffraction, X-ray photoelectron spectroscopy (XPS), UV-visible diffuse reflectance spectroscopy (DRS), photoluminescence spectrum (PLS), thermogravimetric analysis, scanning electron microscopy, and transmission electron microscopy techniques. The results reveal that the microstructure and DRS and PLS characteristics of the composites vary with the composition. XPS Ti 2p peaks for the composites exhibit a shift to lower binding energy in comparison to pure TiO2. The photocatalytic degradation properties of the composites were evaluated using methylene blue (MB) as a model compound under visible light irradiation (400-600 nm). The results indicate that photocatalytic degradation of MB is higher for g-C3N4-TiO2 composites with optimum TiO2 content (26.4 and 80.0 wt%) than for pure g-C3N4 or TiO2. Moreover, the activity of an optimum composite sample was still as high as 91% after use in four consecutive photocatalytic cycles. (C) 2014 Elsevier Ltd. All rights reserved.

引用

页码：966 / 974

页数：9

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[1] Bonding structure of carbon nitride films deposited by reactive plasma beam sputtering [J].