Structural, optical and electrical properties of Hf-doped ZnO transparent conducting films prepared by sol-gel method

被引:18
|
作者
Wang, Fenggui [1 ]
Zhao, Xiaoru [1 ]
Duan, Libing [1 ]
Wang, Yajun [1 ]
Niu, Hongru [1 ]
Ali, Amjed [1 ]
机构
[1] Northwestern Polytech Univ, Key Lab Space Appl Phys & Chem, Minist Educ China, Sch Sci, Xian 710072, Peoples R China
基金
中国国家自然科学基金;
关键词
Hf-doped ZnO; Photoluminescence; Resistivity; Sol-gel method; HFXZN1-XO THIN-FILMS; ANNEALING TEMPERATURE; DOPING CONCENTRATION; HIGHLY TRANSPARENT; RADICAL OXIDATION; DEPOSITION; MICROSTRUCTURE; ORIENTATION; THICKNESS; GROWTH;
D O I
10.1016/j.jallcom.2014.10.117
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Hafnium doped zinc oxide (HZO) thin films with various Hf contents ( 0, 1, 3, 5, 7 at.%) at different solution concentrations (0.15-0.75 mol/L) were deposited on the glass substrates using sol-gel method. The structural, optical and electrical properties were investigated by means of XRD, PL and Hall-effect measurement. The results show that Hf ions could substitute Zn ions effectively and improve the crystallinity of ZnO significantly with highly preferred c-axis orientation. Based on photoluminescence and transmittance measurements, the strong ultraviolet emission band exhibits a blue shift and its intensity is found to rise with the increasing of Hf-doping density. Furthermore, the resistivity shows a bell curve and the minimum value is 5.6 x 10(3) Omega cm for the HZO film with 3 at.% Hf, which is lower than that of the typical Al-doped ZnO thin films using sol-gel method. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:290 / 297
页数:8
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