Scratch and wear behaviours of metallised Ti thin films deposited on Al2O3 substrate

In this work, a modified reaction device was used to deposit metallised Ti films on Al2O3 substrate through the chemical vapour deposition method under different temperatures. Then, the mechanical characteristics of the films were investigated through scratch to determine the plastic behaviours and wear tests to determine the wear mechanism of the thin films. The scratch morphology, wear tracks and wear debris of the films were subjected to microstructural characterisation using a scanning electron microscope equipped with an energy-dispersive spectrometer. Results showed that the scratch and wear resistance of the films are systematically correlated with the plasticity and toughness of the films. The combined film mechanical parameters, such as H-3/E-2 and 1/HE2, obtained through the nanoindentation test correspond well with the highly loaded sliding contact behaviours of the films and can be used to describe the deformation mechanisms of the films. Furthermore, the film deposited at 1050 degrees C has potential applications in ceramic pre-treatments given its combined properties of plasticity and toughness. This combination confers durability to the film by providing an effective energy dissipation mechanism.