Characteristics of lithium thin films under deuterium ion implantation

被引:26
作者
Furuyama, Y [1 ]
Ito, K [1 ]
Dohi, S [1 ]
Taniike, A [1 ]
Kitamura, A [1 ]
机构
[1] Kobe Univ Mercantile Marine, Dept Nucl Engn, Higashinada Ku, Kobe, Hyogo 6580022, Japan
关键词
Li thin films; deuterium implanation; thermal desorption spectroscopy; RBS; ERD; carbon deposition;
D O I
10.1016/S0022-3115(02)01345-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
To clarify characteristics of thin Li films as a plasma facing material, effect of modification of chemical composition of mum-thick deposited Li films introduced during the sample preparation and implantation with 1-keV deuterons on deuterium retention and thermal desorption properties is studied. Accelerator analysis has been employed to measure the thickness, the retention of D, H, O and C in the Li film, while thermal desorption spectroscopy has been utilized to investigate the chemical composition. The Li films exposed to moist atmosphere and subjected to D implantation show almost perfect isotope exchange from LiOH to LiOD. Carbon deposition during ion implantation is found to form a layer mixed with Li. With increasing the deposited amount of C, D-2 desorption behavior approaches that of pure C. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:288 / 291
页数:4
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