Microstructural investigation of Ti-Si-N hard coatings

被引：26

作者：

Tang, Fengzai ^{[1
]}

Gault, Baptiste ^{[2
]}

Ringer, Simon P. ^{[1
]}

Martin, Phil ^{[3
]}

Bendavid, Avi ^{[3
]}

Cairney, Julie M. ^{[1
]}

机构：

[1] Univ Sydney, Australian Key Ctr Microscopy & Microanal, Sydney, NSW 2006, Australia

[2] Univ Oxford, Dept Mat, Oxford OX1 3PH, England

[3] CSIRO Mat Sci & Engn, Lindfield, NSW 2070, Australia

来源：

SCRIPTA MATERIALIA | 2010年 / 63卷 / 02期

基金：

澳大利亚研究理事会;

关键词：

Titanium silicon nitride; Pulsed laser atom probe (PLAP); Nanostructure; Nanocomposite; NANOCOMPOSITE COATINGS; ATOM-PROBE; THIN-FILMS; SPECIMEN PREPARATION; SUPERHARD COATINGS; CATHODIC ARC; PERFORMANCE; DEPOSITION; DESIGN;

D O I：

10.1016/j.scriptamat.2010.03.050

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The microstructures of nanostructured Ti-Si-N hard coatings were investigated by transmission electron microscopy and pulsed laser atom probe. C and O impurities were detected. No evidence of increased Si levels at the grain boundaries was found, suggesting that Si is either in the form of a layer too thin to be detected using the techniques employed or in the form of a solid solution of SiN clusters. (C) 2010 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

引用

页码：192 / 195

页数：4

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