Adsorption of acetylene and ethylene on the Si(001)2x1 surface studied by NEXAFS and UPS

被引：67
|
作者：
Matsui, F
Yeom, HW
Imanishi, A
Isawa, K
Matsuda, I
Ohta, T
机构：
[1] Univ Tokyo, Grad Sch Sci, Dept Chem, Bunkyo Ku, Tokyo 113, Japan
[2] Univ Tokyo, Fac Sci, Res Ctr Spectrochem, Bunkyo Ku, Tokyo 113, Japan
来源：
SURFACE SCIENCE | 1998年 / 401卷 / 02期
关键词：
alkenes; alkynes; chemisorption; near edge X-ray absorption fine structure; silicon; ultraviolet photoemission spectroscopy;
D O I：
10.1016/S0039-6028(98)00038-7
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The adsorption of acetylene (C2H2) and ethylene (C2H4) on the Si(001)2 x 1 surface has been investigated by near edge X-ray adsorption fine structure (NEXAFS) and ultraviolet photoemission spectroscopy (UPS) using synchrotron radiation. Upon molecular adsorption, a drastic decrease of the pi* resonance (C2H4) and an energy shift of the sigma* resonance (both C2H2 and C2H4) were observed in the NEXAFS spectra. The intensity of dangling bond states of Si dimers in the UPS spectra diminished significantly by adsorption of both molecules. These results provide firm evidence for the structure model with Si dimers preserved and the di-sigma bonding between the adsorbed molecules and Si dimers. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：L413 / L419
页数：7
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