Femtosecond laser ablation properties of borosilicate glass

被引:220
作者
Ben-Yakar, A [1 ]
Byer, RL
机构
[1] Univ Texas, Dept Mech Engn, Austin, TX 78712 USA
[2] Stanford Univ, Dept Appl Phys, Ginzton Lab, Stanford, CA 94305 USA
关键词
D O I
10.1063/1.1787145
中图分类号
O59 [应用物理学];
学科分类号
摘要
We study the femtosecond laser ablation properties of borosilicate glass using atomic force microscopy and laser pulses of 200 fs duration, centered at 780 nm wavelength. We show that both single-shot and multishot ablation threshold fluences can be determined by studying the diameter and the depth of single-shot ablated craters. The linear relationship between the square of the crater diameter and the logarithm of the laser fluence in the form of D-2=2w(0)(2)ln(F-0/F-th(N=1)) provides the single-shot ablation threshold, F-th(N=1), whereas the linear relationship between the ablation depth and the logarithm of laser fluence in the form of h(a)=alpha(eff)(-1)ln(F-0/F-th(N>1)) provides the multishot ablation threshold, F-th(N>1). The results depict a multishot ablation threshold of approximate to1.7 J/cm(2) independent of the atmospheric conditions. The slopes of the linear fits also provide a precise estimate of the beam radius at the surface, w(0)approximate to5.9 mum, and the "effective optical penetration depth," alpha(eff)(-1)approximate to238 nm in air. The method is systematic, provides results that are consistent with the literature, and eliminates uncertainties because of instrument sensitivities. We also show that threshold measurement based on the extrapolation of volume to zero, a method used often in previous studies, is somewhat questionable. Finally, the measured dimensions of ablated craters reveal that the ablation volume per unit input energy is about 1.3-1.5 mum(3)/muJ at an intermediate fluence regime of 10<F-0(av)<40 J/cm(2). This value represents an order of magnitude larger ablation efficiency when compared to the ablation of glass with nanosecond ultraviolet laser pulses. (C) 2004 American Institute of Physics.
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页码:5316 / 5323
页数:8
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共 31 条
  • [1] [Anonymous], 1986, OPTICS
  • [2] SPACE-TIME OBSERVATION OF AN ELECTRON-GAS IN SIO2
    AUDEBERT, P
    DAGUZAN, P
    DOSSANTOS, A
    GAUTHIR, JC
    GEINDRE, JP
    GUIZARD, S
    HAMONIAUX, G
    KRASTEV, K
    MARTIN, P
    PETITE, G
    ANTONETTI, A
    [J]. PHYSICAL REVIEW LETTERS, 1994, 73 (14) : 1990 - 1993
  • [3] Thermal and fluid processes of a thin melt zone during femtosecond laser ablation of glass
    Ben-Yakar, A
    Harkin, A
    Ashmore, J
    Shen, MY
    Mazur, E
    Byer, RL
    Stone, HA
    [J]. PHOTON PROCESSING IN MICROELECTRONICS AND PHOTONICS II, 2003, 4977 : 335 - 345
  • [4] LASER-INDUCED ELECTRIC BREAKDOWN IN SOLIDS
    BLOEMBER.N
    [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1974, QE10 (03) : 375 - 386
  • [5] Ultrashort-pulse laser ablation of indium phosphide in air
    Bonse, J
    Wrobel, JM
    Krüger, J
    Kautek, W
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2001, 72 (01): : 89 - 94
  • [6] Effect of vacuum on the occurrence of UV-induced surface photoluminescence, transmission loss, and catastrophic surface damage
    Burnham, AK
    Runkel, M
    Demos, SG
    Kozlowski, MR
    Wegner, PJ
    [J]. PHOTONICS FOR SPACE ENVIRONMENTS VII, 2000, 4134 : 243 - 252
  • [7] Doremus RobertH., 1994, GLASS SCI
  • [8] Laser shaping of photonic materials: deep-ultraviolet and ultrafast lasers
    Herman, PR
    Marjoribanks, RS
    Oettl, A
    Chen, K
    Konovalov, I
    Ness, S
    [J]. APPLIED SURFACE SCIENCE, 2000, 154 : 577 - 586
  • [9] Microscopic mechanisms of ablation and micromachining of dielectrics by using femtosecond lasers
    Jia, TQ
    Xu, ZZ
    Li, XX
    Li, RX
    Shuai, B
    Zhao, FL
    [J]. APPLIED PHYSICS LETTERS, 2003, 82 (24) : 4382 - 4384
  • [10] Laser ablation of dielectrics with pulse durations between 20 fs and 3 ps
    Kautek, W
    Kruger, J
    Lenzner, M
    Sartania, S
    Spielmann, C
    Krausz, F
    [J]. APPLIED PHYSICS LETTERS, 1996, 69 (21) : 3146 - 3148