Photoluminescence of porous silicon layers oxidized in controlled water vapor conditions.

被引:0
|
作者
Vasquez-A, M. A. [1 ]
Garcia-Salgado, G. [2 ]
Romero-Paredes, G. [1 ]
Pena-Sierra, R. [1 ]
机构
[1] IPN, CINVESTAV, Dept Ingn Elect, SEES, Mexico City 07738, DF, Mexico
[2] BUAP, Ctr Invest Disposit Semicond, Puebla, Mexico
来源
2006 3RD INTERNATIONAL CONFERENCE ON ELECTRICAL AND ELECTRONICS ENGINEERING | 2006年
关键词
optical properties; photolurninescence; point defects; porous silicon; thin films;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A study of the evolution of the photoluminescence spectra features on chemically treated and controlled aged porous silicon layers (PSL) prepared by the electrochemical method is presented Room temperature photoluminescence (PL) spectra of freshly prepared PSL show a characteristic peak located at similar to 700 nm. The PL spectrum of chemically oxidized and successively water vapor oxidized PSL strongly modifies compared to the PL spectra of freshly prepared samples. Those variations are associated with the changes on the PSL structure induced by the applied oxidization processes. The evolution of the characteristic PL features gives us the ability to identify the signal due to the quantum size effect (QSE) and to assign high energy transitions produced by some kind of defect centers.
引用
收藏
页码:306 / +
页数:3
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